Inventor · disambiguated record
Kristina Vogt
Also filed as: VOGT KRISTINA
0 granted patents·13 pending applications·0 citations·filing 2001–2024
Files withBOSCH GMBH ROBERT5
Top patents by PatentIndex Score
13 records- 0165US2025183087A1Carrier layer for a semiconductor wafer and method for applying such a carrier layer to a semiconductor waferBOSCH GMBH ROBERT·Filed 2024·Application pending·0 cites
- 0258US2025079224A1Method for producing semiconductor components from a wafer using a carrier waferBOSCH GMBH ROBERT·Filed 2024·Application pending·0 cites
- 0357US2025054746A1Method for producing semiconductor components from a wafer with selective application of edge insulationBOSCH GMBH ROBERT·Filed 2024·Application pending·0 cites
- 0455US2024194743A1Semiconductor wafer and method for processing a semiconductor waferBOSCH GMBH ROBERT·Filed 2023·Application pending·0 cites
- 0551US2023274928A1Method for manufacturing a carrier substrate on a semiconductor wafer and device including a semiconductor waferBOSCH GMBH ROBERT·Filed 2023·Application pending·0 cites
- 0641US2004065864A1Acidic polishing slurry for the chemical-mechanical polishing of SiO2 isolation layersFiled 2003·Application pending·0 cites
- 0739US2002129560A1Acidic polishing slurry for the chemical-mechanical polishing of SiO2 isolation layersFiled 2001·Application pending·0 cites
- 0839US2005026205A1Method of polishing metal and metal/dielectric structuresFiled 2004·Application pending·0 cites
- 0936US2003098446A1Composition for the chemical-mechanical polishing of metal and metal/dielectric structures with high selectivityFiled 2002·Application pending·0 cites
- 1036US2002127954A1Process for the chemical-mechanical polishing of isolation layers produced using the STI technology, at elevated temperaturesFiled 2001·Application pending·0 cites
- 1134US2002106900A1Polishing slurry for the chemical-mechanical polishing of metal and dielectric structuresFiled 2001·Application pending·0 cites
- 1234US2003061766A1Polishing agent and method for producing planar layersFiled 2001·Application pending·0 cites
- 1330US2002170237A1Polishing slurry for the chemical-mechanical polishing of silica filmsFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →