Inventor · disambiguated record
Kui-Jong Baek
Also filed as: BAEK KUI J · BAEK KUI-JONG
5 granted patents·7 pending applications·33 citations·filing 2002–2011
75Inventor score
Files withSAMSUNG ELECTRONICS CO LTD4TECHNO SEMICHEM CO LTD3HONG EUN S1KIM BONG-KYUN1LEE KWANG-WOOK1
Top patents by PatentIndex Score
12 records- 0180US6881679B2Etching solution for etching Cu and Cu/Ti metal layer of liquid crystal display device and method of fabricating the sameLG PHILIPS LCD CO LTD·Filed 2002·Granted Apr 19, 2005·24 cites·20 claims
- 0275US7851372B2Composition for removing an insulation material, method of removing an insulation layer and method of recycling a substrate using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Granted Dec 14, 2010·5 cites·14 claims
- 0363US7951765B2Photoresist stripper composition for semiconductor manufacturingTECHNO SEMICHEM CO LTD·Filed 2006·Granted May 31, 2011·3 cites·6 claims
- 0457US7985982B2Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2009·Granted Jul 26, 2011·1 cites·3 claims
- 0548US2006172907A1Microelectronic cleaning agent(s) and method(s) of fabricating semiconductor device(s) using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 0648US2006287208A1Methods of Forming Corrosion-Inhibiting Cleaning Compositions for Metal Layers and Patterns on Semiconductor SubstratesSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 0746US8173546B2Etchant composition, patterning conductive layer and manufacturing flat panel, display device using the sameKIM BONG-KYUN·Filed 2011·Granted May 8, 2012·0 cites·8 claims
- 0843US2005261151A1Corrosion-inhibiting cleaning compositions for metal layers and patterns on semiconductor substratesLEE KWANG-WOOK·Filed 2005·Application pending·0 cites
- 0940US2006234516A1Composition for cleaning semiconductor device and method for cleaning semiconductor device using the sameHONG EUN S·Filed 2005·Application pending·0 cites
- 1039US2006014391A1Method of manufacturing a semiconductor device using a cleaning compositionLEE KYUNG-JIN·Filed 2005·Application pending·0 cites
- 1132US2009298289A1Chemical Mechanical Polishing Composition for Copper Comprising ZeoliteTECHNO SEMICHEM CO LTD·Filed 2007·Application pending·0 cites
- 1230US2011045741A1Auto-Stopping Abrasive Composition for Polishing High Step Height Oxide LayerTECHNO SEMICHEM CO LTD·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →