Inventor · disambiguated record
Kuo-Kuei Fu
Also filed as: FU KUO-KUEI
8 granted patents·3 pending applications·11 citations·filing 2004–2021
77Inventor score
Top patents by PatentIndex Score
11 records- 0182US7984392B2Matching method for designing layout patterns on a photomask from inverse lithographyNANYA TECHNOLOGY CORP·Filed 2009·Granted Jul 19, 2011·7 cites·17 claims
- 0270US8831333B2Mask pattern analysis apparatus and method for analyzing mask patternFU KUO KUEI·Filed 2012·Granted Sep 9, 2014·2 cites·18 claims
- 0350US12197124B2Lithography measurement machine and operating method thereofHON HAI PREC IND CO LTD·Filed 2021·Granted Jan 14, 2025·0 cites·10 claims
- 0449US7811723B2Phase-shift mask and method for forming a patternNANYA TECHNOLOGY CORP·Filed 2008·Granted Oct 12, 2010·0 cites·8 claims
- 0548US8497568B2Monitoring pattern, and pattern stitch monitoring method and wafer therewithFU KUO KUEI·Filed 2011·Granted Jul 30, 2013·0 cites·13 claims
- 0647US8192902B2Replaced photomaskFU KUO-KUEI·Filed 2011·Granted Jun 5, 2012·0 cites·6 claims
- 0745US8533638B2Post-optical proximity correction photoresist pattern collapse ruleFU KUO KUEI·Filed 2011·Granted Sep 10, 2013·0 cites·5 claims
- 0845US7452639B2Photomask with photoresist test patterns and pattern inspection methodGRACE SEMICONDUCTOR MFG CORP·Filed 2004·Granted Nov 18, 2008·2 cites·14 claims
- 0936US2012259445A1Method for matching assistant feature toolsFU KUO KUEI·Filed 2011·Application pending·0 cites
- 1036US2007212655A1Method for applying T-shaped photo-resist pattern to fabricate a wiring pattern with small structural dimensionsFU KUO-KUEI·Filed 2006·Application pending·0 cites
- 1129US2006103034A1Overlay mark for a non-critical layer of critical dimensionsFU KUO-KUEI·Filed 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →