Inventor · disambiguated record
Kumiko Hayashi
Also filed as: HAYASHI KUMIKO
5 granted patents·9 pending applications·0 citations·filing 2017–2024
58Inventor score
Top patents by PatentIndex Score
14 records- 0163US2024160105A1Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation methodSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0257US2025217865A1System and information processing deviceTOYOTA MOTOR CO LTD·Filed 2024·Application pending·0 cites
- 0357US2025014061A1Information processing deviceTOYOTA MOTOR CO LTD·Filed 2024·Application pending·0 cites
- 0454US2024210831A1Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation methodSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0554US2024288772A1Photosensitive resin composition, photosensitive resin film, photosensitive dry film, and pattern formation methodSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 0652US11448563B2Force measurement method, force measurement device, force measurement system, force measurement program, and recording mediumUNIV TOHOKU·Filed 2018·Granted Sep 20, 2022·0 cites·9 claims
- 0752US2024428179A1Information providing deviceTOYOTA MOTOR CO LTD·Filed 2024·Application pending·0 cites
- 0851US2025218182A1Information processing device, system and method for operating systemTOYOTA MOTOR CO LTD·Filed 2024·Application pending·0 cites
- 0950US2024184206A1Laminate, method for manufacturing laminate, and method for patterningSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
- 1044US12055853B2Photosensitive resin composition, laminate, and pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Aug 6, 2024·0 cites·10 claims
- 1143US11294282B2Epoxy-containing, isocyanurate-modified silicone resin, photosensitive resin composition, photosensitive dry film, laminate, and pattern forming processSHINETSU CHEMICAL CO·Filed 2018·Granted Apr 5, 2022·0 cites·22 claims
- 1243US11142612B2Mesogen-silicon compound (co)polymer and thermoplastic elastomerSHINETSU CHEMICAL CO·Filed 2018·Granted Oct 12, 2021·0 cites·2 claims
- 1341US11231414B2Magnetic composite particles, method for manufacturing the same, and immunoassay particlesUNIV TOHOKU·Filed 2017·Granted Jan 25, 2022·0 cites·10 claims
- 1441US2022236644A1Photosensitive resin composition, photosensitive dry film, layered product, and pattern formation methodSHINETSU CHEMICAL CO·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →