Inventor · disambiguated record
Kuen-Yu Tsai
Also filed as: TSAI KUEN-YU
17 granted patents·6 pending applications·51 citations·filing 2004–2023
91Inventor score
Top patents by PatentIndex Score
23 records- 0191US10665696B2Method for non-resist nanolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted May 26, 2020·4 cites·20 claims
- 0291US9972702B2Method for non-resist nanolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted May 15, 2018·7 cites·20 claims
- 0386US12308368B2Method for non-resist nanolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted May 20, 2025·0 cites·20 claims
- 0485US9087173B2Determining proximity effect parameters for non-rectangular semiconductor structuresTSAI KUEN-YU·Filed 2010·Granted Jul 21, 2015·12 cites·20 claims
- 0583US11855190B2Methods for non-resist nanolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Dec 26, 2023·0 cites·20 claims
- 0683US9570301B2Projection patterning with exposure maskUNIV NAT TAIWAN·Filed 2014·Granted Feb 14, 2017·5 cites·20 claims
- 0777US8438505B2Method for improving accuracy of parasitics extraction considering sub-wavelength lithography effectsTSAI KUEN-YU·Filed 2012·Granted May 7, 2013·8 cites·19 claims
- 0873US11532729B2Method for non-resist nanolithographyTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Dec 20, 2022·0 cites·20 claims
- 0973US9934969B2Charged-particle-beam patterning without resistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Granted Apr 3, 2018·2 cites·20 claims
- 1072US8578303B1Method for compensating effect of patterning process and apparatus thereofTSAI KUEN-YU·Filed 2012·Granted Nov 5, 2013·4 cites·20 claims
- 1170US9541500B2Method for calibrating a manufacturing process modelTSAI KUEN-YU·Filed 2012·Granted Jan 10, 2017·2 cites·14 claims
- 1264US8539392B2Method for compensating proximity effects of particle beam lithography processesTSAI KUEN-YU·Filed 2012·Granted Sep 17, 2013·2 cites·13 claims
- 1358US10615036B2Charged-particle-beam patterning without resistTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 7, 2020·0 cites·20 claims
- 1456US8490033B2Method and apparatus for designing patterning system based on patterning fidelityTSAI KUEN-YU·Filed 2012·Granted Jul 16, 2013·1 cites·8 claims
- 1552US6992542B2Method for fast design of multi-objective frequency-shaping equalizersUNIV STANFORD·Filed 2004·Granted Jan 31, 2006·4 cites·12 claims
- 1649US2012112086A1System and method for estimating change of status of particle beamsTSAI KUEN-YU·Filed 2011·Application pending·0 cites
- 1749US2012112065A1Apparatus and method for estimating change of status of particle beamsTSAI KUEN-YU·Filed 2011·Application pending·0 cites
- 1849US2012112091A1Method for adjusting status of particle beams for patterning a substrate and system using the sameTSAI KUEN-YU·Filed 2011·Application pending·0 cites
- 1947US10007752B2Determining proximity effect parameters for non rectangular semiconductor structuresTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jun 26, 2018·0 cites·17 claims
- 2046US9418049B2Method and system for establishing parametric modelTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Aug 16, 2016·0 cites·21 claims
- 2141US2015212427A1Multilayer mirror structureUNIV NAT TAIWAN·Filed 2014·Application pending·0 cites
- 2240US2004225383A1Method for Design of Multi-objective Robust ControllersUNIV STANFORD·Filed 2004·Application pending·0 cites
- 2335US2013297061A1Method and computer-aided design system of manufacturing an optical systemTSAI KUEN-YU·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →