Inventor · disambiguated record
Kwen-Woo Han
Also filed as: HAN KWEN-WOO
14 granted patents·2 pending applications·18 citations·filing 2008–2020
85Inventor score
Top patents by PatentIndex Score
16 records- 0188US7851789B2Photosensitive resin composition for pad protective layer, and method for making image sensor using the sameCHEIL IND INC·Filed 2008·Granted Dec 14, 2010·12 cites·15 claims
- 0275US10093830B2Composition for forming a silica based layer, method for manufacturing silica based layer, and electronic device including the silica based layerSAMSUNG SDI CO LTD·Filed 2015·Granted Oct 9, 2018·1 cites·13 claims
- 0369US8841218B2Resist underlayer composition and process of producing integrated circuit devices using sameHAN KWEN-WOO·Filed 2012·Granted Sep 23, 2014·2 cites·14 claims
- 0465US10732504B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Aug 4, 2020·1 cites·10 claims
- 0559US11254871B2Etching composition for silicon nitride layer and method of etching silicon nitride layer using the sameSAMSUNG SDI CO LTD·Filed 2020·Granted Feb 22, 2022·0 cites·12 claims
- 0658US8628698B2Resin composition for protection layer of color filter, protection layer of color filter using same and image sensor including sameCHOI SE-YOUNG·Filed 2010·Granted Jan 14, 2014·2 cites·9 claims
- 0754US2015093545A1Composition for a silica based layer, silica based layer, and method of manufacturing a silica based layerSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 0850US9738787B2Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layerCHEIL IND INC·Filed 2013·Granted Aug 22, 2017·0 cites·9 claims
- 0948US9890255B2Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for formingCHEIL IND INC·Filed 2013·Granted Feb 13, 2018·0 cites·19 claims
- 1046US9902873B2Composition for forming silica based layer, and method for manufacturing silica based layerSAMSUNG SDI CO LTD·Filed 2014·Granted Feb 27, 2018·0 cites·10 claims
- 1141US8962747B2Resist underlayer composition and process of producing integrated circuit devices using the sameKIM MI-YOUNG·Filed 2012·Granted Feb 24, 2015·0 cites·5 claims
- 1240US11608471B2Composition for etching silicon nitride film and etching method using sameSAMSUNG SDI CO LTD·Filed 2019·Granted Mar 21, 2023·0 cites·16 claims
- 1337US11493848B2Resist underlayer composition, and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2018·Granted Nov 8, 2022·0 cites·17 claims
- 1436US9312122B2Rinse liquid for insulating film and method of rinsing insulating filmBAE JIN-HEE·Filed 2013·Granted Apr 12, 2016·0 cites·11 claims
- 1534US11518909B2Composition for forming silica layer, manufacturing method for silica layer, and silica layerSAMSUNG SDI CO LTD·Filed 2018·Granted Dec 6, 2022·0 cites·12 claims
- 1631US2017250206A1Composition for forming silica layer, method for manufacturing silica layer, and silica layerSAMSUNG SDI CO LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →