Inventor · disambiguated record
Kye Hyun Baek
Also filed as: BAEK KYE-HYUN
18 granted patents·13 pending applications·37 citations·filing 1998–2024
90Inventor score
Files withSAMSUNG ELECTRONICS CO LTD15MICRON TECHNOLOGY INC4BAEK KYE-HYUN3PARK SANGWUK2HAN EUN-YOUNG1
Top patents by PatentIndex Score
31 records- 0192US8005562B2Process-parameter prognostic system for predicting shape of semiconductor structure, semiconductor fabrication apparatus having the system, and method of using the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2008·Granted Aug 23, 2011·20 cites·5 claims
- 0289US11211450B2Integrated circuit device and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Dec 28, 2021·4 cites·18 claims
- 0388US11482536B2Electronic devices comprising memory pillars and dummy pillars including an oxide material, and related systems and methodsMICRON TECHNOLOGY INC·Filed 2020·Granted Oct 25, 2022·2 cites·37 claims
- 0480US2025126854A1Integrated circuit device and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2024·Application pending·0 cites
- 0577US2024357820A1Microelectronic devices including slot structures extending through pillar structures, and related memory devicesLODESTAR LICENSING GROUP LLC·Filed 2024·Application pending·0 cites
- 0675US12041775B2Electronic devices comprising memory pillars and dummy pillars including an oxide material, and related systems and methodsMICRON TECHNOLOGY INC·Filed 2022·Granted Jul 16, 2024·0 cites·20 claims
- 0775US2024099007A1Memory devices and related electronic systemsMICRON TECHNOLOGY INC·Filed 2023·Application pending·0 cites
- 0872US10991825B2Semiconductor device including non-active fins and separation regionsSAMSUNG ELECTRONICS CO LTD·Filed 2018·Granted Apr 27, 2021·2 cites·20 claims
- 0971US12218193B2Integrated circuit device and method of forming the sameSAMSUNG ELECTRONICS CO LTD·Filed 2021·Granted Feb 4, 2025·0 cites·19 claims
- 1069US11309393B2Integrated circuit device including an overhanging hard mask layerSAMSUNG ELECTRONICS CO LTD·Filed 2019·Granted Apr 19, 2022·1 cites·14 claims
- 1168US8805567B2Method of controlling semiconductor process distributionLEE HO-KI·Filed 2011·Granted Aug 12, 2014·3 cites·22 claims
- 1264US11903196B2Microelectronic devices including tiered stacks including conductive structures isolated by slot structures, and related electronic systems and methodsMICRON TECHNOLOGY INC·Filed 2020·Granted Feb 13, 2024·0 cites·22 claims
- 1363US12015063B2Method of manufacturing an integrated circuit device including a fin-type active regionSAMSUNG ELECTRONICS CO LTD·Filed 2022·Granted Jun 18, 2024·0 cites·20 claims
- 1463US9136138B2Equipment for manufacturing semiconductor device and seasoning process method of the sameBAEK KYE HYUN·Filed 2011·Granted Sep 15, 2015·2 cites·23 claims
- 1558US9912258B2Electrostatic chuck assemblies capable of bidirectional flow of coolant and semiconductor fabricating apparatus having the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Mar 6, 2018·1 cites·20 claims
- 1658US8872059B2Etching system and method of controlling etching process conditionPARK SANG-WUK·Filed 2011·Granted Oct 28, 2014·1 cites·20 claims
- 1749US2015114559A1Plasma shielding members, plasma detecting structures, and plasma reaction apparatusesHAN EUN-YOUNG·Filed 2014·Application pending·0 cites
- 1845US6686289B2Method for minimizing variation in etch rate of semiconductor wafer caused by variation in mask pattern densityHYNIX SEMICONDUCTOR INC·Filed 2002·Granted Feb 3, 2004·1 cites·13 claims
- 1945US2008035170A1Cleaning apparatus for cleaning a chamber used in manufacturing a semiconductor device and method of cleaning a chamber by using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 2044US8498731B2Method of using process-parameter prognostic system for predicting shape of semiconductor structureBAEK KYE-HYUN·Filed 2011·Granted Jul 30, 2013·0 cites·12 claims
- 2141US8741164B2Methods for optimizing a plasma processPARK SANGWUK·Filed 2012·Granted Jun 3, 2014·0 cites·18 claims
- 2239US2011215072A1Plasma apparatus having a controller for controlling a plasma chamber and methods for controlling the plasma apparatusPARK SANGWUK·Filed 2011·Application pending·0 cites
- 2338US2007020780A1Method of processing semiconductor substrate responsive to a state of chamber contaminationBAEK KYE-HYUN·Filed 2006·Application pending·0 cites
- 2437US2011140719A1Method of monitoring semiconductor processSAMSUNG ELECTRONICS CO LTD·Filed 2010·Application pending·0 cites
- 2536US9870900B2Methods and systems for managing semiconductor manufacturing equipmentSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Jan 16, 2018·0 cites·15 claims
- 2636US9859175B2Substrate processing system, method of managing the same and method of manufacturing semiconductor device with the sameSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Jan 2, 2018·0 cites·20 claims
- 2736US2010262398A1Methods of Selecting Sensors for Detecting Abnormalities in Semiconductor Manufacturing ProcessesSAMSUNG ELECTRONICS CO LTD·Filed 2010·Application pending·0 cites
- 2835US2017032987A1Dry etching apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 2932US2017047200A1Plasma Processing ApparatusSAMSUNG ELECTRONICS CO LTD·Filed 2016·Application pending·0 cites
- 3032US2016099086A1Substrate transfer system having ionizerLEE JAE-WOOK·Filed 2015·Application pending·0 cites
- 3129US2002137340A1Plasma etching method for semiconductor device and etching apparatus of the sameFiled 1998·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →