Inventor · disambiguated record
Kyoung-Hwan Chin
Also filed as: CHIN KYOUNG H · CHIN KYOUNG HWAN
3 granted patents·3 pending applications·3 citations·filing 2001–2014
52Inventor score
Technology areasH10P
Top patents by PatentIndex Score
6 records- 0142US7165443B2Vacuum leakage detecting device for use in semiconductor manufacturing systemSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jan 23, 2007·3 cites·2 claims
- 0239US9233334B2Byproducts treating device and a facility for manufacturing semiconductor devices having the byproducts treating deviceSAMSUNG ELECTRONICS CO LTD·Filed 2014·Granted Jan 12, 2016·0 cites·26 claims
- 0332US2005211279A1Cleaning apparatus of a high density plasma chemical vapor deposition chamber and cleaning thereofCHIN KYOUNG H·Filed 2005·Application pending·0 cites
- 0431US2007281447A1Method of loading and/or unloading wafer in semiconductor manufacturing apparatusLEE HYUNG-GOO·Filed 2006·Application pending·0 cites
- 0528US8025736B2Semiconductor device fabrication equipment for performing PEOX process and method including cleaning the equipment with remotely produced plasmaSAMSUNG ELECTRONICS CO LTD·Filed 2007·Granted Sep 27, 2011·0 cites·6 claims
- 0620US2002195124A1Cleaning apparatus of a high density plasma chemical vapor deposition chamber and cleaning method thereofFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →