Inventor · disambiguated record
Kyoichi Iwata
Also filed as: IWATA KYOICHI
10 granted patents·2 pending applications·30 citations·filing 2003–2018
85Inventor score
Top patents by PatentIndex Score
12 records- 0186US11045922B2Surface treatment processing method and surface treatment processing deviceSINTOKOGIO LTD·Filed 2017·Granted Jun 29, 2021·3 cites·12 claims
- 0268US7905766B2Centrifugally projecting machineSINTOKOGIO LTD·Filed 2006·Granted Mar 15, 2011·4 cites·23 claims
- 0366US7210322B2Dent distribution diagram drawing method and system in shotblasting, and processing conditions setting method and shotblasting deviceSINTOKOGIO LTD·Filed 2003·Granted May 1, 2007·10 cites·6 claims
- 0461US8219367B2Method of estimating information on projection conditions by a projection machine and a device thereofIWATA KYOICHI·Filed 2006·Granted Jul 10, 2012·3 cites·23 claims
- 0554US8702476B2Machine for centrifugally shooting abrasivesITO MASAKATSU·Filed 2009·Granted Apr 22, 2014·2 cites·2 claims
- 0651US11446786B2Part manufacturing system and part manufacturing methodMITSUBISHI HEAVY IND LTD·Filed 2018·Granted Sep 20, 2022·0 cites·4 claims
- 0751US11389930B2Surface treatment processing method and surface treatment processing deviceSINTOKOGIO LTD·Filed 2018·Granted Jul 19, 2022·0 cites·7 claims
- 0850US2007112454A1Method and system for drawing dent distribution diagram in shotblasting, and method for setting processing condition and shotblasting deviceSINTOKOGIO LTD·Filed 2007·Application pending·0 cites
- 0940USD799345SResidual stress measuring deviceSINTOKOGIO LTD·Filed 2016·Granted Oct 10, 2017·3 cites·1 claims
- 1040USD798173SResidual stress measuring deviceSINTOKOGIO LTD·Filed 2016·Granted Sep 26, 2017·3 cites·1 claims
- 1140US2009286456A1Control-cage, a centrifugal shot-blasting device, and a centrifugal shot-blasting device for throwing abrasive grainsITO MASAKATSU·Filed 2006·Application pending·0 cites
- 1236USD798753SResidual stress measuring deviceSINTOKOGIO LTD·Filed 2016·Granted Oct 3, 2017·2 cites·1 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →