Inventor · disambiguated record
Kye-Weon Kim
Also filed as: KIM KYE-WEON
6 granted patents·3 pending applications·23 citations·filing 2001–2007
77Inventor score
Top patents by PatentIndex Score
9 records- 0173US7385689B2Method and apparatus for inspecting substrate patternSAMSUNG ELECTRONICS CO LTD·Filed 2005·Granted Jun 10, 2008·5 cites·35 claims
- 0265US6650408B2Method for inspecting a polishing pad in a semiconductor manufacturing process, an apparatus for performing the method, and a polishing device adopting the apparatusSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Nov 18, 2003·12 cites·19 claims
- 0355US7081952B2Method and apparatus for obtaining an image using a selective combination of wavelengths of lightSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jul 25, 2006·2 cites·12 claims
- 0446US6870948B2Method and apparatus for numerically analyzing grain growth on semiconductor wafer using SEM imageSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Mar 22, 2005·1 cites·31 claims
- 0545US6850332B2Method for measuring step difference in a semiconductor device and apparatus for performing the sameSAMSUNG ELECTRONICS CO LTD·Filed 2001·Granted Feb 1, 2005·2 cites·12 claims
- 0643US2007190438A1Method and apparatus for controlling light intensity and for exposing a semiconductor substrateSAMSUNG ELECTRONICS CO LTD·Filed 2007·Application pending·0 cites
- 0741US2007184565A1Test pattern and method for measuring silicon etching depthSAMSUNG ELECTRONICS CO LTD·Filed 2006·Application pending·0 cites
- 0839US7355729B2Apparatus and method for measuring a thickness of a substrateSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Apr 8, 2008·1 cites·19 claims
- 0938US2007028771A1Adsorption apparatus, semiconductor device manufacturing facility comprising the same, and method of recycling perfulorocompoundsSHIN JI-YOUNG·Filed 2006·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Kye-Weon Kim files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →