Inventor · disambiguated record
Kyoko Kuroki
Also filed as: KUROKI KYOKO
4 granted patents·7 pending applications·17 citations·filing 2001–2023
67Inventor score
Files withTOPPAN PHOTOMASK CO LTD4LSI LOGIC CORP3TOPPAN PRINTING CO LTD2LSI CORP1TEKSCEND PHOTOMASK CORP1
Top patents by PatentIndex Score
11 records- 0171US7056392B1Wafer chucking apparatus and method for spin processorLSI LOGIC CORP·Filed 2003·Granted Jun 6, 2006·15 cites·8 claims
- 0256US11005065B2Laminate comprising tantalum oxide and method of producing the same, gas barrier film and method of producing the same, and organic light-emitting elementTOPPAN PRINTING CO LTD·Filed 2018·Granted May 11, 2021·0 cites·14 claims
- 0355US2014141218A1Laminate body, gas barrier film, method of manufacturing laminate body, and laminate body manufacturing apparatusTOPPAN PRINTING CO LTD·Filed 2014·Application pending·0 cites
- 0454US2024302732A1Phase shift mask blank, phase shift mask, and method for manufacturing phase shift maskTOPPAN PHOTOMASK CO LTD·Filed 2022·Application pending·0 cites
- 0554US2024152045A1Phase shift mask blank, phase shift mask, method for manufacturing phase shift mask, and method for modifying phase shift maskTOPPAN PHOTOMASK CO LTD·Filed 2022·Application pending·0 cites
- 0653US2023333461A1Phase shift mask blank, phase shift mask, and method for manufacturing phase shift maskTOPPAN PHOTOMASK CO LTD·Filed 2021·Application pending·0 cites
- 0753US2024419064A1Phase shift mask and method for manufacturing phase shift maskTOPPAN PHOTOMASK CO LTD·Filed 2023·Application pending·0 cites
- 0848US2008135981A1Substrate Laser MarkingLSI CORP·Filed 2008·Application pending·0 cites
- 0946US7201176B2Wafer chucking apparatus for spin processorLSI LOGIC CORP·Filed 2006·Granted Apr 10, 2007·0 cites·11 claims
- 1046US2025147408A1Phase shift mask and method for manufacturing phase shift maskTEKSCEND PHOTOMASK CORP·Filed 2023·Application pending·0 cites
- 1145US7371659B1Substrate laser markingLSI LOGIC CORP·Filed 2001·Granted May 13, 2008·2 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →