Inventor · disambiguated record
Kyle Patterson
Also filed as: PATTERSON KYLE · PATTERSON KYLE W
7 granted patents·3 pending applications·37 citations·filing 2003–2019
79Inventor score
Files withFREESCALE SEMICONDUCTOR INC5ADVANCED MICRO DEVICES INC1FREESCALES SEMICONDUCTOR INC1LUCAS KEVIN D1MOTOROLA INC1
Top patents by PatentIndex Score
10 records- 0179US7109101B1Capping layer for reducing amorphous carbon contamination of photoresist in semiconductor device manufacture; and process for making sameMOTOROLA INC·Filed 2003·Granted Sep 19, 2006·26 cites·15 claims
- 0268US6972255B2Semiconductor device having an organic anti-reflective coating (ARC) and method thereforADVANCED MICRO DEVICES INC·Filed 2003·Granted Dec 6, 2005·10 cites·14 claims
- 0359US7935547B2Method of patterning a layer using a pellicleFREESCALE SEMICONDUCTOR INC·Filed 2006·Granted May 3, 2011·1 cites·10 claims
- 0452US8039389B2Semiconductor device having an organic anti-reflective coating (ARC) and method thereforFREESCALE SEMICONDUCTOR INC·Filed 2007·Granted Oct 18, 2011·0 cites·2 claims
- 0549US7199429B2Semiconductor device having an organic anti-reflective coating (ARC) and method thereforFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Apr 3, 2007·0 cites·6 claims
- 0647US11014622B1Retractable cover systemsPATTERSON KYLE·Filed 2019·Granted May 25, 2021·0 cites·19 claims
- 0739US2008250374A1Method of Making an Integrated CircuitFREESCALE SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 0837US2006199087A1Method of making an integrated circuit by modifying a design layout by accounting for a parameter that varies based on a location within an exposure fieldLUCAS KEVIN D·Filed 2005·Application pending·0 cites
- 0936US2008171285A1Immersion Lithography Technique And Product Using A Protection Layer Covering The ResistFREESCALES SEMICONDUCTOR INC·Filed 2005·Application pending·0 cites
- 1032US7615318B2Printing of design features using alternating PSM technology with double mask exposure strategyFREESCALE SEMICONDUCTOR INC·Filed 2005·Granted Nov 10, 2009·0 cites·12 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →