Inventor · disambiguated record
Kyoichi Suguro
Also filed as: SUGURO KYOICHI
138 granted patents·21 pending applications·4,879 citations·filing 1985–2018
99Inventor score
Top patents by PatentIndex Score
159 records- 0199US9613872B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2015·Granted Apr 4, 2017·156 cites·20 claims
- 0299US6737716B1Semiconductor device and method of manufacturing the sameTOKYO SHIBAURA ELECTRIC CO·Filed 2000·Granted May 18, 2004·391 cites·7 claims
- 0398US6541829B2Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2000·Granted Apr 1, 2003·248 cites·14 claims
- 0498US6482714B1Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2000·Granted Nov 19, 2002·171 cites·24 claims
- 0597US7078776B2Low threshold voltage semiconductor deviceTOSHIBA KK·Filed 2004·Granted Jul 18, 2006·126 cites·4 claims
- 0697US6737724B2Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2002·Granted May 18, 2004·124 cites·12 claims
- 0797US6376888B1Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2000·Granted Apr 23, 2002·175 cites·8 claims
- 0896US6770944B2Semiconductor device having counter and channel impurity regionsTOSHIBA KK·Filed 2002·Granted Aug 3, 2004·121 cites·26 claims
- 0996US5719410ASemiconductor device wiring or electrodeTOSHIBA KK·Filed 1996·Granted Feb 17, 1998·173 cites·16 claims
- 1095US6939787B2Method for fabricating semiconductor device having gate electrode with polymetal structure of polycrystalline silicon film and metal filmTOSHIBA KK·Filed 2004·Granted Sep 6, 2005·97 cites·6 claims
- 1195US6476454B2Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2001·Granted Nov 5, 2002·74 cites·18 claims
- 1294US8981507B2Method for manufacturing nonvolatile memory deviceTAKAHASHI SHIGEKI·Filed 2012·Granted Mar 17, 2015·13 cites·21 claims
- 1394US6614033B2Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processesTOSHIBA KK·Filed 2001·Granted Sep 2, 2003·71 cites·28 claims
- 1494US6465290B1Method of manufacturing a semiconductor device using a polymer film patternTOSHIBA KK·Filed 2001·Granted Oct 15, 2002·88 cites·19 claims
- 1594US6100193AMethod of manufacturing a semiconductor deviceTOSHIBA KK·Filed 1997·Granted Aug 8, 2000·137 cites·25 claims
- 1693US6346438B1Method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 1998·Granted Feb 12, 2002·91 cites·32 claims
- 1793US5731634ASemiconductor device having a metal film formed in a groove in an insulating filmTOSHIBA KK·Filed 1996·Granted Mar 24, 1998·102 cites·14 claims
- 1893US5592024ASemiconductor device having a wiring layer with a barrier layerTOSHIBA KK·Filed 1994·Granted Jan 7, 1997·133 cites·5 claims
- 1992US5903053ASemiconductor deviceTOSHIBA KK·Filed 1996·Granted May 11, 1999·107 cites·29 claims
- 2091US6794286B2Process for fabricating a metal wiring and metal contact in a semicondutor deviceTOSHIBA KK·Filed 2000·Granted Sep 21, 2004·55 cites·11 claims
- 2190US9159769B2Semiconductor device, semiconductor device manufacturing method, and semiconductor device manufacturing apparatusTOSHIBA KK·Filed 2013·Granted Oct 13, 2015·7 cites·15 claims
- 2290US7745073B2Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the sameTOSHIBA KK·Filed 2008·Granted Jun 29, 2010·10 cites·7 claims
- 2390US7091114B2Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2002·Granted Aug 15, 2006·38 cites·19 claims
- 2490US6607958B2Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2002·Granted Aug 19, 2003·40 cites·15 claims
- 2590US6271573B1Semiconductor device with gate structure and method of manufacturing the sameTOSHIBA KK·Filed 1998·Granted Aug 7, 2001·74 cites·24 claims
- 2690US5189503AHigh dielectric capacitor having low current leakageTOSHIBA KK·Filed 1991·Granted Feb 23, 1993·128 cites·12 claims
- 2789US6335534B1Ion implantation apparatus, ion generating apparatus and semiconductor manufacturing method with ion implantation processesTOSHIBA KK·Filed 1999·Granted Jan 1, 2002·81 cites·31 claims
- 2888US7459246B2Method for manufacturing a semiconductor device, stencil mask and method for manufacturing a the sameTOSHIBA KK·Filed 2007·Granted Dec 2, 2008·9 cites·8 claims
- 2988US5989988ASemiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 1998·Granted Nov 23, 1999·76 cites·8 claims
- 3088US5907188ASemiconductor device with conductive oxidation preventing film and method for manufacturing the sameTOSHIBA KK·Filed 1996·Granted May 25, 1999·82 cites·12 claims
- 3188US5162263ASemiconductor device having salicide structure, method of manufacturing the same, and heating apparatusTOSHIBA KK·Filed 1991·Granted Nov 10, 1992·101 cites·12 claims
- 3287US6730581B2Semiconductor device and method of manufacture thereofTOSHIBA KK·Filed 2001·Granted May 4, 2004·34 cites·5 claims
- 3387US5192714AMethod of manufacturing a multilayered metallization structure in which the conductive layer and insulating layer are selectively depositedTOSHIBA KK·Filed 1991·Granted Mar 9, 1993·50 cites·12 claims
- 3486US7579231B2Semiconductor device and method of manufacturing the sameTOSHIBA KK·Filed 2004·Granted Aug 25, 2009·29 cites·12 claims
- 3586US7179569B2Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the sameTOSHIBA KK·Filed 2004·Granted Feb 20, 2007·24 cites·14 claims
- 3686US6770402B2Method for manufacturing a semiconductor device, stencil mask and method for manufacturing the sameTOSHIBA KK·Filed 2001·Granted Aug 3, 2004·24 cites·1 claims
- 3786US6162741ASemiconductor device and manufacturing method thereforTOSHIBA KK·Filed 1997·Granted Dec 19, 2000·77 cites·5 claims
- 3886US5409862AMethod for making aluminum single crystal interconnections on insulatorsTOSHIBA KK·Filed 1993·Granted Apr 25, 1995·56 cites·15 claims
- 3986US5316977AMethod of manufacturing a semiconductor device comprising metal silicideTOSHIBA KK·Filed 1992·Granted May 31, 1994·56 cites·13 claims
- 4085US8441073B2Semiconductor device and manufacturing method for the sameNAKAJIMA KAZUAKI·Filed 2011·Granted May 14, 2013·6 cites·6 claims
- 4185US5654237AMethod of manufacturing semiconductor deviceTOSHIBA KK·Filed 1995·Granted Aug 5, 1997·59 cites·25 claims
- 4284US7781848B2Semiconductor device with extension structure and method for fabricating the sameTOSHIBA KK·Filed 2007·Granted Aug 24, 2010·8 cites·7 claims
- 4384US7763553B2Manufacturing method of semiconductor device subjected to heat treatment by use of optical heating apparatusTOSHIBA KK·Filed 2008·Granted Jul 27, 2010·9 cites·16 claims
- 4484US7501332B2Doping method and manufacturing method for a semiconductor deviceTOSHIBA KK·Filed 2005·Granted Mar 10, 2009·9 cites·18 claims
- 4584US6033537ASputtering target and method of manufacturing a semiconductor deviceTOSHIBA KK·Filed 1997·Granted Mar 7, 2000·51 cites·20 claims
- 4684US5670808AMetal oxide capacitor with a WNX electrodeTOSHIBA KK·Filed 1996·Granted Sep 23, 1997·50 cites·6 claims
- 4783US8716034B2Method of manufacturing magnetic memoryOHSAWA YUICHI·Filed 2011·Granted May 6, 2014·7 cites·26 claims
- 4883US6881631B2Method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2003·Granted Apr 19, 2005·32 cites·19 claims
- 4983US6770519B2Semiconductor manufacturing method using two-stage annealingTOSHIBA KK·Filed 2002·Granted Aug 3, 2004·24 cites·16 claims
- 5083US6365492B1Apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor deviceTOSHIBA KK·Filed 2000·Granted Apr 2, 2002·22 cites·17 claims
Showing the top 50 of 159 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →