Inventor · disambiguated record
Lai-Wan Chong
Also filed as: CHONG LAI-WAN
9 granted patents·2 pending applications·11 citations·filing 2012–2022
81Inventor score
Top patents by PatentIndex Score
11 records- 0188US9806154B2FinFET structure and method for manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Oct 31, 2017·4 cites·20 claims
- 0282US8735255B2Method of manufacturing semiconductor deviceHSIAO WEN CHU·Filed 2012·Granted May 27, 2014·6 cites·20 claims
- 0375US11929398B2FinFET structure and method for manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Mar 12, 2024·0 cites·20 claims
- 0475US2022367635A1Finfet structure and method for manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Application pending·0 cites
- 0560US11450742B2FinFET structure and method for manufacturing thereofTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Sep 20, 2022·0 cites·20 claims
- 0658US9214393B2Surface tension modification using silane with hydrophobic functional group for thin film depositionCHONG LAI WAN·Filed 2012·Granted Dec 15, 2015·1 cites·20 claims
- 0755US9735271B2Semiconductor deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Aug 15, 2017·0 cites·20 claims
- 0855US9324863B2Semiconductor deviceTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Apr 26, 2016·0 cites·19 claims
- 0953US2015361547A1Method and apparatus for cleaning chemical vapor deposition chamberTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2014·Application pending·0 cites
- 1051US9698263B2Surface tension modification using silane with hydrophobic functional group for thin film depositionTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Jul 4, 2017·0 cites·18 claims
- 1142US10153199B2Semiconductor device and fabrication method thereforTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Dec 11, 2018·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →