Inventor · disambiguated record

Liang-Guang Chen

Also filed as: CHEN LIANG · CHEN LIANG-GUANG

73 granted patents·17 pending applications·139 citations·filing 2003–2025

98Inventor score

Technology areasH10P H10W B24B H10D B08B

Files withTAIWAN SEMICONDUCTOR MFG CO LTD73 TAIWAN SEMICONDUCTOR MFG7 SUEN SHICH-CHANG2 TU CHE-HAO2 HOLMAN HOI-YING N1

Top patents by PatentIndex Score

90 records

0195US9987720B2Method for operating a polishing head and method for polishing a substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Jun 5, 2018·7 cites·20 claims
0295US9352443B2Platen assembly, chemical-mechanical polisher, and method for polishing substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted May 31, 2016·16 cites·19 claims
0394US9630295B2Mechanisms for removing debris from polishing padTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Apr 25, 2017·25 cites·20 claims
0493US10504782B2Fin Field-Effect Transistor device and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 10, 2019·6 cites·20 claims
0591US9209272B2Oxidation and etching post metal gate CMPTAIWAN SEMICONDUCTOR MFG·Filed 2013·Granted Dec 8, 2015·10 cites·20 claims
0690US9917173B2Oxidation and etching post metal gate CMPTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2017·Granted Mar 13, 2018·5 cites·20 claims
0789US9460997B2Interconnect structure for semiconductor devicesTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Oct 4, 2016·7 cites·20 claims
0889US9449841B2Methods and systems for chemical mechanical polish and cleanTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Sep 20, 2016·8 cites·19 claims
0988US10269555B2Post-CMP cleaning and apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Apr 23, 2019·4 cites·20 claims
1087US9564511B2Oxidation and etching post metal gate CMPTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2015·Granted Feb 7, 2017·4 cites·20 claims
1186US11772228B2Chemical mechanical polishing apparatus including a multi-zone platenTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Oct 3, 2023·2 cites·20 claims
1286US11679469B2Chemical mechanical planarization toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 20, 2023·2 cites·18 claims
1384US11482450B2Methods of forming an abrasive slurry and methods for chemical- mechanical polishingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 25, 2022·1 cites·20 claims
1484US11024540B2Fin field-effect transistor device and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Jun 1, 2021·2 cites·20 claims
1584US9962805B2Chemical mechanical polishing apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted May 8, 2018·2 cites·20 claims
1684US9272386B2Polishing head, and chemical-mechanical polishing system for polishing substrateTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Mar 1, 2016·4 cites·20 claims
1784US9076766B2Mechanism for forming metal gate structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2013·Granted Jul 7, 2015·5 cites·20 claims
1883US12172263B2Chemical mechanical planarization toolTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 24, 2024·0 cites·20 claims
1983US12170195B2Post-CMP cleaning and apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 17, 2024·0 cites·20 claims
2082US9768064B1Formation method of semiconductor device structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2016·Granted Sep 19, 2017·3 cites·20 claims
2181US12486479B2Semiconductor device cleaning solution, method of use, and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Dec 2, 2025·0 cites·20 claims
2281US11996283B2Method for metal gate surface cleanTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted May 28, 2024·0 cites·20 claims
2380US10967478B2Chemical mechanical polishing apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Apr 6, 2021·2 cites·20 claims
2480US2025353138A1Chemical-mechanical planarization pad and methods of useTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
2580US2025269487A1Chemical mechanical polishing apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
2678US12224179B2Metal heterojunction structure with capping metal layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Granted Feb 11, 2025·0 cites·20 claims
2778US11728157B2Post-CMP cleaning and apparatusTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Aug 15, 2023·0 cites·20 claims
2878US8021566B2Method for pre-conditioning CMP polishing padTAIWAN SEMICONDUCTOR MFG·Filed 2006·Granted Sep 20, 2011·6 cites·14 claims
2978US2025345896A1Polishing Pad for Chemical Mechanical Polishing and MethodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
3077US2025313723A1Composition and method for polishing and integrated circuitTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
3176US12002684B2Methods for chemical mechanical polishing and forming interconnect structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jun 4, 2024·0 cites·20 claims
3276US2025329591A1In-situ defect count detection in post chemical mechanical polishingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2025·Application pending·0 cites
3376US2024290629A1Methods for chemical mechanical polishing and forming interconnect structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
3475US2024363361A1Semiconductor processing tool and methods of operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
3574US11410846B2Method for metal gate surface cleanTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Aug 9, 2022·0 cites·20 claims
3674US10937691B2Methods of forming an abrasive slurry and methods for chemical-mechanical polishingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2019·Granted Mar 2, 2021·1 cites·20 claims
3774US8598028B2Gate height loss improvement for a transistorTU CHE-HAO·Filed 2011·Granted Dec 3, 2013·5 cites·15 claims
3873US8975179B2Planarization process for semiconductor device fabricationTU CHE-HAO·Filed 2011·Granted Mar 10, 2015·5 cites·16 claims
3973US2024379421A1Slurry composition, semiconductor structure and method for forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2024·Application pending·0 cites
4072US11728215B2Fin Field-Effect Transistor device and method of forming the sameTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 15, 2023·0 cites·20 claims
4171US12325102B2Chemical mechanical polishing apparatus and methodTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Jun 10, 2025·0 cites·20 claims
4271US11637021B2Metal heterojunction structure with capping metal layerTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Apr 25, 2023·0 cites·20 claims
4370US12068169B2Semiconductor processing tool and methods of operationTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Aug 20, 2024·0 cites·20 claims
4470US11773353B2Semiconductor device cleaning solution, method of use, and method of manufactureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2021·Granted Oct 3, 2023·0 cites·20 claims
4570US9269585B2Method for cleaning metal gate surfaceTAIWAN SEMICONDUCTOR MFG·Filed 2014·Granted Feb 23, 2016·1 cites·20 claims
4669US10510601B2Method for reducing metal plug corrosion and deviceTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2018·Granted Dec 17, 2019·1 cites·20 claims
4769US2023364733A1Chemical Mechanical Polishing Apparatus Including a Multi-Zone PlatenTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2023·Application pending·0 cites
4868US12347735B2In-situ defect count detection in post chemical mechanical polishingTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2022·Granted Jul 1, 2025·0 cites·20 claims
4967US11508585B2Methods for chemical mechanical polishing and forming interconnect structureTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Nov 22, 2022·0 cites·20 claims
5066US12359090B2Composition and method for polishing and integrated circuitTAIWAN SEMICONDUCTOR MFG CO LTD·Filed 2020·Granted Jul 15, 2025·0 cites·20 claims

Showing the top 50 of 90 patent records by PatentIndex Score.

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →