Inventor · disambiguated record
Lin-Chiu Chiang
Also filed as: CHIANG LIN-CHIU
12 granted patents·132 citations·filing 1997–2001
91Inventor score
Files withNIPPON MEKTRON KK12
Top patents by PatentIndex Score
12 records- 0182US5859181ASiloxane polymide and heat-resistant adhesive containing the sameNIPPON MEKTRON KK·Filed 1997·Granted Jan 12, 1999·48 cites·11 claims
- 0273US6096850APolyimides, process for producing the same and photosensitive composition containing the sameNIPPON MEKTRON KK·Filed 1999·Granted Aug 1, 2000·25 cites·11 claims
- 0362US5942592ASiloxane polyimide and heat-resistant adhesive containing the sameNIPPON MEKTRON KK·Filed 1998·Granted Aug 24, 1999·21 cites·11 claims
- 0455US6582885B2Polyimides, process for producing the same and photosensitive composition containing the sameNIPPON MEKTRON KK·Filed 2001·Granted Jun 24, 2003·2 cites·9 claims
- 0553US6025461APhotosensitive polyimideNIPPON MEKTRON KK·Filed 1998·Granted Feb 15, 2000·12 cites·7 claims
- 0648US6077924APolyimides, process for producing the same and photosensitive composition containing the sameNIPPON MEKTRON KK·Filed 1999·Granted Jun 20, 2000·9 cites·13 claims
- 0741US6232039B1Photosensitive compositionNIPPON MEKTRON KK·Filed 2000·Granted May 15, 2001·4 cites·6 claims
- 0839US6245484B1Polymides, process for producing the same and photosensitive composition the sameNIPPON MEKTRON KK·Filed 2000·Granted Jun 12, 2001·3 cites·3 claims
- 0937US5849932ABismaleimide compound and process for producing the sameNIPPON MEKTRON KK·Filed 1997·Granted Dec 15, 1998·1 cites·4 claims
- 1035US6365324B1Photosensitive compositionNIPPON MEKTRON KK·Filed 1999·Granted Apr 2, 2002·3 cites·4 claims
- 1129US6486290B1Polyimides, process for producing the same and photosensitive composition containing the sameNIPPON MEKTRON KK·Filed 1999·Granted Nov 26, 2002·0 cites·4 claims
- 1228US5986038AAdhesive compositionNIPPON MEKTRON KK·Filed 1998·Granted Nov 16, 1999·4 cites·13 claims
Join the waitlist — get patent alerts
Get an alert when Lin-Chiu Chiang files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →