Inventor · disambiguated record
Limin Lou
Also filed as: LOU LIMIN · LOU LIMIN ERIC
1 granted patent·2 pending applications·16 citations·filing 2003–2008
40Inventor score
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3 records- 0175US7241538B2Method for providing representative features for use in inspection of photolithography mask and for use in inspection photo-lithographically developed and/or patterned wafer layers, and products of samePROMOS TECHNOLOGIES·Filed 2003·Granted Jul 10, 2007·16 cites·12 claims
- 0243US2007099093A1Method for providing representative features for use in inspection of photolithography mask and for use in inspection of photo-lithographically developed and/or patterned wafer layers, and products of sameZHANG FENG-HONG·Filed 2006·Application pending·0 cites
- 0332US2010063764A1Use of different pairs of overlay layers to check an overlay measurement recipeLOU LIMIN·Filed 2008·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →