Inventor · disambiguated record
Louise Peccoud
Also filed as: PECCOUD LOUISE
5 granted patents·345 citations·filing 1977–1990
85Inventor score
Files withCOMMISSARIAT ENERGIE ATOMIQUE5
Top patents by PatentIndex Score
5 records- 0194US4491496AEnclosure for the treatment, and particularly for the etching of substrates by the reactive plasma methodCOMMISSARIAT ENERGIE ATOMIQUE·Filed 1984·Granted Jan 1, 1985·121 cites·5 claims
- 0293US5105761ADiffusion plasma-assisted chemical treatment apparatusCOMMISSARIAT ENERGIE ATOMIQUE·Filed 1990·Granted Apr 21, 1992·123 cites·12 claims
- 0380US5047115AProcess for etching by gas plasmaCOMMISSARIAT ENERGIE ATOMIQUE·Filed 1988·Granted Sep 10, 1991·62 cites·13 claims
- 0474US4124474AMethod and apparatus for controlling the deposition of films by reactive sputteringCOMMISSARIAT ENERGIE ATOMIQUE·Filed 1977·Granted Nov 7, 1978·27 cites·10 claims
- 0541US4990859AProcess and apparatus for determining the impedance of the discharge in a plasma reactor system comprising a tuning box and application to the regulation of the impedance or the ionic current in such reactorCOMMISSARIAT ENERGIE ATOMIQUE·Filed 1989·Granted Feb 5, 1991·12 cites·6 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →