Inventor · disambiguated record
M. Dalil Rahman
Also filed as: RAHMAN M D · RAHMAN M DALIL
74 granted patents·16 pending applications·994 citations·filing 1992–2020
99Inventor score
Files withCLARIANT FINANCE BVI LTD28HOECHST CELANESE CORP18AZ ELECTRONIC MATERIALS USA16RAHMAN M DALIL12MERCK PATENT GMBH4
Top patents by PatentIndex Score
90 records- 0198US6447980B1Photoresist composition for deep UV and process thereofCLARIANT FINANCE BVI LTD·Filed 2000·Granted Sep 10, 2002·144 cites·12 claims
- 0297US7678528B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Mar 16, 2010·34 cites·9 claims
- 0396US6991888B2Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Jan 31, 2006·84 cites·19 claims
- 0494US7521170B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Apr 21, 2009·21 cites·8 claims
- 0592US7390613B1Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Jun 24, 2008·16 cites·20 claims
- 0691US7932018B2Antireflective coating compositionAZ ELECTRONIC MATERIALS USA·Filed 2008·Granted Apr 26, 2011·17 cites·18 claims
- 0791US5994430AAntireflective coating compositions for photoresist compositions and use thereofCLARIANT FINANCE BVI LTD·Filed 1997·Granted Nov 30, 1999·42 cites·22 claims
- 0889US9274426B2Antireflective coating compositions and processes thereofAZ ELECTRONIC MATERIALS LUXEMBOURG SARL·Filed 2014·Granted Mar 1, 2016·12 cites·20 claims
- 0988US9315636B2Stable metal compounds, their compositions and methodsYAO HUIRONG·Filed 2012·Granted Apr 19, 2016·6 cites·22 claims
- 1086US9201305B2Spin-on compositions of soluble metal oxide carboxylates and methods of their useRAHMAN M DALIL·Filed 2013·Granted Dec 1, 2015·8 cites·21 claims
- 1185US8017296B2Antireflective coating composition comprising fused aromatic ringsAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Sep 13, 2011·11 cites·25 claims
- 1285US5981145ALight absorbing polymersCLARIANT FINANCE BVI LTD·Filed 1997·Granted Nov 9, 1999·59 cites·7 claims
- 1385US5580700AMetal ion reduction in bottom anti-reflective coatings for use in semiconductor device formationHOECHST CELANESE CORP·Filed 1995·Granted Dec 3, 1996·60 cites·10 claims
- 1484US7358408B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Apr 15, 2008·14 cites·1 claims
- 1583US7989144B2Antireflective coating compositionAZ ELECTRONIC MATERIALS USA·Filed 2008·Granted Aug 2, 2011·9 cites·18 claims
- 1681US6610465B2Process for producing film forming resins for photoresist compositionsCLARIANT FINANCE BVI LTD·Filed 2001·Granted Aug 26, 2003·23 cites·53 claims
- 1779US8906592B2Antireflective coating composition and process thereofRAHMAN M DALIL·Filed 2012·Granted Dec 9, 2014·2 cites·14 claims
- 1879US5286606AProcess for producing a developer having a low metal ion levelHOECHST CELANESE CORP·Filed 1992·Granted Feb 15, 1994·32 cites·9 claims
- 1977US5476750AMetal ion reduction in the raw materials and using a Lewis base to control molecular weight of novolak resin to be used in positive photoresistsHOECHST CELANESE CORP·Filed 1992·Granted Dec 19, 1995·32 cites·7 claims
- 2075US5521052AMetal ion reduction in novolak resin using an ion exchange catalyst in a polar solvent and photoresists compositions therefromHOECHST CELANESE CORP·Filed 1994·Granted May 28, 1996·39 cites·9 claims
- 2173US8486609B2Antireflective coating composition and process thereofRAHMAN M DALIL·Filed 2009·Granted Jul 16, 2013·5 cites·17 claims
- 2272US5516886AMetal ion reduction in top anti-reflective coatings for photoresistsHOECHST CELANESE CORP·Filed 1994·Granted May 14, 1996·21 cites·9 claims
- 2371US7833693B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2008·Granted Nov 16, 2010·1 cites·10 claims
- 2466US9152051B2Antireflective coating composition and process thereofRAHMAN M DALIL·Filed 2013·Granted Oct 6, 2015·1 cites·20 claims
- 2566US7547501B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Jun 16, 2009·1 cites·5 claims
- 2663US5688893AMethod of using a Lewis base to control molecular weight of novolak resinsHOECHST CELANESE CORP·Filed 1996·Granted Nov 18, 1997·18 cites·5 claims
- 2762US7491482B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Feb 17, 2009·7 cites·4 claims
- 2862US5543263APhotoresist having a low level of metal ionsHOECHST CELANESE CORP·Filed 1994·Granted Aug 6, 1996·16 cites·3 claims
- 2961US7601480B2Photoactive compoundsAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Oct 13, 2009·6 cites·8 claims
- 3060US5614352AMetal ion reduction in novolak resins solution in PGMEA by chelating ion exchange resinHOECHST CELANESE CORP·Filed 1994·Granted Mar 25, 1997·11 cites·14 claims
- 3159US7122291B2Photoresist compositionsAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted Oct 17, 2006·15 cites·12 claims
- 3259US5739265AFractionation of phenol formaldehyde condensate and photoresist compositions produced therefromCLARIANT FINANCE BVI LTD·Filed 1995·Granted Apr 14, 1998·13 cites·20 claims
- 3358US11767398B2Spin-on compositions comprising an inorganic oxide component and an alkynyloxy substituted spin-on carbon component useful as hard masks and filling materials with improved shelf lifeMERCK PATENT GMBH·Filed 2020·Granted Sep 26, 2023·0 cites·8 claims
- 3457US2008058542A1Photoactive CompoundsRAHMAN M D·Filed 2007·Application pending·0 cites
- 3556US5837417AQuinone diazide compositions containing low metals p-cresol oligomers and process of producing the compositionCLARIANT FINANCE BVI LTD·Filed 1994·Granted Nov 17, 1998·11 cites·9 claims
- 3656US5624789AMetal ion reduction in top anti-reflective coatings for photoresisisHOECHST CELANESE CORP·Filed 1995·Granted Apr 29, 1997·14 cites·10 claims
- 3755US12099305B2Rinse and method of use thereof for removing edge protection layers and residual metal hardmask componentsMERCK PATENT GMBH·Filed 2020·Granted Sep 24, 2024·0 cites·23 claims
- 3855US2008096127A1Photoactive CompoundsRAHMAN M DALIL·Filed 2007·Application pending·0 cites
- 3955US2008261147A1Photoactive CompoundsRAHMAN M DALIL·Filed 2007·Application pending·0 cites
- 4054US6106995AAntireflective coating material for photoresistsCLARIANT FINANCE BVI LTD·Filed 1999·Granted Aug 22, 2000·14 cites·17 claims
- 4154US5371169ANovolak resin mixturesHOECHST CELANESE CORP·Filed 1992·Granted Dec 6, 1994·12 cites·6 claims
- 4253US7537879B2Photoresist composition for deep UV and process thereofAZ ELECTRONIC MATERIALS USA·Filed 2004·Granted May 26, 2009·3 cites·20 claims
- 4353US5962183AMetal ion reduction in photoresist compositions by chelating ion exchange resinCLARIANT FINANCE BVI LTD·Filed 1995·Granted Oct 5, 1999·14 cites·9 claims
- 4453US5750632AIsolation of novolak resin by low temperature sub surface forced steam distillationCLARIANT FINANCE BVI LTD·Filed 1994·Granted May 12, 1998·9 cites·10 claims
- 4552US6297352B1Method of reducing metal ion content of film-forming resins using a liquid/liquid centrifugeCLARIANT FINANCE BVI LTD·Filed 2000·Granted Oct 2, 2001·2 cites·12 claims
- 4652US6121412APreparation of fractionated novolak resins by a novel extraction techniqueCLARIANT FINANCE BVI LTD·Filed 1999·Granted Sep 19, 2000·14 cites·33 claims
- 4752US5665517AAcidic ion exchange resin as a catalyst to synthesize a novolak resin and photoresist composition therefromHOECHST CELANESE CORP·Filed 1996·Granted Sep 9, 1997·15 cites·8 claims
- 4851US10241409B2Materials containing metal oxides, processes for making same, and processes for using sameAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2015·Granted Mar 26, 2019·0 cites·13 claims
- 4951US2008035556A1Process for producing film forming resins for photoresist compositionsPADMANABAN MUNIRATHNA·Filed 2007·Application pending·0 cites
- 5050US6512087B1Fractionation of resins using a static mixer and a liquid-liquid centrifugeCLARIANT FINANCE BVI LTD·Filed 2000·Granted Jan 28, 2003·1 cites·15 claims
Showing the top 50 of 90 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when M. Dalil Rahman files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →