Inventor · disambiguated record
Masahiro Aono
Also filed as: AONO MASAHIRO
12 granted patents·5 pending applications·20 citations·filing 2005–2024
86Inventor score
Files withTANAKA PRECIOUS METAL IND8HITACHI LTD3SAMSUNG ELECTRONICS CO LTD2TOYOTA JIDOSHOKKI KK2KYORIN SEIYAKU KK1
Top patents by PatentIndex Score
17 records- 0187US8858674B2FePt—C-based sputtering target and process for producing the sameMIYASHITA TAKANOBU·Filed 2012·Granted Oct 14, 2014·8 cites·15 claims
- 0286US9590663B2Radio apparatusHITACHI LTD·Filed 2016·Granted Mar 7, 2017·6 cites·16 claims
- 0382US10551101B2Air conditioner and control method thereof for determining an amount of refrigerantSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Feb 4, 2020·3 cites·20 claims
- 0480US9095901B2FePt-based sputtering targetTANAKA PRECIOUS METAL IND·Filed 2014·Granted Aug 4, 2015·1 cites·8 claims
- 0576US11810700B2In-plane magnetized film, in-plane magnetized film multilayer structure, hard bias layer, magnetoresistive element, and sputtering targetTANAKA PRECIOUS METAL IND·Filed 2019·Granted Nov 7, 2023·1 cites·20 claims
- 0670US9358612B2FePt-based sputtering targetTANAKA PRECIOUS METAL IND·Filed 2014·Granted Jun 7, 2016·0 cites·18 claims
- 0770US9314845B2Process for producing FePt-based sputtering targetTANAKA PRECIOUS METAL IND·Filed 2014·Granted Apr 19, 2016·0 cites·20 claims
- 0870US9314846B2Process for producing FePt-based sputtering targetTANAKA PRECIOUS METAL IND·Filed 2014·Granted Apr 19, 2016·0 cites·26 claims
- 0968US9228255B2FePt-C-based sputtering target and process for producing the sameTANAKA PRECIOUS METAL IND·Filed 2014·Granted Jan 5, 2016·0 cites·33 claims
- 1066US2025291325A1Control system, control mediation device, and control mediation methodHITACHI LTD·Filed 2024·Application pending·0 cites
- 1162US9705588B2Wireless communication system and wireless communication receiverHITACHI LTD·Filed 2016·Granted Jul 11, 2017·1 cites·10 claims
- 1255US2016211124A1Warp correction method for sputtering target with backing plateTANAKA PRECIOUS METAL IND·Filed 2014·Application pending·0 cites
- 1352US2023405699A1Electrochemical machining apparatusTOYOTA JIDOSHOKKI KK·Filed 2021·Application pending·0 cites
- 1451US2024091872A1Electrochemical machining deviceTOYOTA JIDOSHOKKI KK·Filed 2021·Application pending·0 cites
- 1546US2021087673A1Sputtering targetTANAKA PRECIOUS METAL IND·Filed 2019·Application pending·0 cites
- 1644US7868183B2Process for producing muscarine receptor antagonist and intermediate thereforKYORIN SEIYAKU KK·Filed 2005·Granted Jan 11, 2011·0 cites·11 claims
- 1742US10866018B2Air conditioner and control method thereofSAMSUNG ELECTRONICS CO LTD·Filed 2016·Granted Dec 15, 2020·0 cites·8 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →