Inventor · disambiguated record
Markus Brotsack
Also filed as: BROTSACK MARKUS · SCHINK HARALD
9 granted patents·6 pending applications·291 citations·filing 2004–2011
90Inventor score
Top patents by PatentIndex Score
15 records- 0195US7847921B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2008·Granted Dec 7, 2010·30 cites·7 claims
- 0295US7511886B2Optical beam transformation system and illumination system comprising an optical beam transformation systemZEISS CARL SMT AG·Filed 2005·Granted Mar 31, 2009·63 cites·54 claims
- 0395US7408616B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodZEISS CARL SMT AG·Filed 2004·Granted Aug 5, 2008·70 cites·44 claims
- 0493US7460206B2Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2004·Granted Dec 2, 2008·71 cites·3 claims
- 0592US7283209B2Illumination system for microlithographyZEISS CARL SMT AG·Filed 2005·Granted Oct 16, 2007·16 cites·48 claims
- 0691US7714983B2Illumination system for a microlithography projection exposure installationZEISS CARL SMT AG·Filed 2004·Granted May 11, 2010·38 cites·35 claims
- 0775US7884922B2Illumination system for microlithographyZEISS CARL SMT AG·Filed 2007·Granted Feb 8, 2011·3 cites·25 claims
- 0854US2008297745A1Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 0954US2008291419A1Projection objective for immersion lithographyZEISS CARL SMT AG·Filed 2008·Application pending·0 cites
- 1051US8767181B2Microlithographic exposure method as well as a projection exposure system for carrying out the methodGRUNER TORALF·Filed 2010·Granted Jul 1, 2014·0 cites·19 claims
- 1148US2010195077A1Illumination system for a microlithography projection exposure installationZEISS CARL SMT AG·Filed 2010·Application pending·0 cites
- 1246US8792082B2Illumination system for microlithographyBROTSACK MARKUS·Filed 2011·Granted Jul 29, 2014·0 cites·23 claims
- 1342US2006126049A1Illumination system for a microlithography projection exposure apparatusZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 1441US2007285644A1Microlithographic Projection Exposure ApparatusZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 1534US2008273186A1Illumination System, In Particular For A Projection Exposure Machine In Semiconductor LithographyBROTSACK MARKUS·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →