Inventor · disambiguated record
Masayuki Endo
Also filed as: ENDO MASAYUKI · SATOH TAKASHI · TAKEUCHI YASUMASA
167 granted patents·37 pending applications·2,212 citations·filing 1978–2017
99Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD107PANASONIC CORP22SHINETSU CHEMICAL CO16CENTRAL GLASS CO LTD11ENDO MASAYUKI8
Top patents by PatentIndex Score
204 records- 0196US4745042AWater-soluble photopolymer and method of forming pattern by use of the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1985·Granted May 17, 1988·95 cites·12 claims
- 0295US5645628AElectroless plating bath used for forming a wiring of a semiconductor device, and method of forming a wiring of a semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted Jul 8, 1997·182 cites·2 claims
- 0394US7195860B2Semiconductor manufacturing apparatus and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Mar 27, 2007·47 cites·11 claims
- 0494US4182813AProcess for the preparation of 1,2-polybutadieneJAPAN SYNTHETIC RUBBER CO LTD·Filed 1978·Granted Jan 8, 1980·58 cites·20 claims
- 0592USD543278SSyringeTERUMO CORP·Filed 2006·Granted May 22, 2007·48 cites·1 claims
- 0690US5525457AReflection preventing film and process for forming resist pattern using the sameJAPAN SYNTHETIC RUBBER CO LTD·Filed 1994·Granted Jun 11, 1996·69 cites·10 claims
- 0789US6399267B1Radiation sensitive resin composition and use of the same in an interlaminar insulating filmJSR CORP·Filed 2000·Granted Jun 4, 2002·42 cites·20 claims
- 0888US7488567B2Polymer, resist composition and patterning processPANASONIC CORP·Filed 2006·Granted Feb 10, 2009·9 cites·20 claims
- 0988US5558976APattern formation methodWAKO PURE CHEM IND LTD·Filed 1995·Granted Sep 24, 1996·67 cites·2 claims
- 1087US7666967B2Ester compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Feb 23, 2010·5 cites·4 claims
- 1187US5558971AResist materialWAKO PURE CHEM IND LTD·Filed 1995·Granted Sep 24, 1996·79 cites·7 claims
- 1284US5958648ARadiation sensitive resin compositionJSR CORP·Filed 1998·Granted Sep 28, 1999·51 cites·14 claims
- 1383US6875556B2Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Apr 5, 2005·20 cites·9 claims
- 1483US6710148B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 23, 2004·20 cites·20 claims
- 1583US4841341AIntegrator for an exposure apparatus or the likeMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1987·Granted Jun 20, 1989·34 cites·14 claims
- 1682US7713685B2Exposure system and pattern formation methodPANASONIC CORP·Filed 2005·Granted May 11, 2010·5 cites·20 claims
- 1782US6949329B2Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Sep 27, 2005·20 cites·9 claims
- 1882US6303516B1Method for forming dot elementMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1998·Granted Oct 16, 2001·55 cites·10 claims
- 1982US5530036AEpoxy group-containing copolymer and radiation sensitive resin compositions thereofJAPAN SYNTHETIC RUBBER CO LTD·Filed 1994·Granted Jun 25, 1996·34 cites·27 claims
- 2082US5399604AEpoxy group-containing resin compositionsJAPAN SYNTHETIC RUBBER CO LTD·Filed 1993·Granted Mar 21, 1995·46 cites·11 claims
- 2182US4849323APattern forming method using contrast enhanced materialMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1987·Granted Jul 18, 1989·15 cites·3 claims
- 2281US6306556B1Pattern forming material and pattern forming methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Oct 23, 2001·13 cites·1 claims
- 2380US7455950B2Resist material and pattern formation method using the samePANASONIC CORP·Filed 2007·Granted Nov 25, 2008·4 cites·11 claims
- 2480US5576247AThin layer forming method wherein hydrophobic molecular layers preventing a BPSG layer from absorbing moistureMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Nov 19, 1996·71 cites·3 claims
- 2580US4724466AExposure apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1987·Granted Feb 9, 1988·29 cites·13 claims
- 2679US7947432B2Pattern formation methodPANASONIC CORP·Filed 2007·Granted May 24, 2011·4 cites·28 claims
- 2779US7943285B2Pattern formation methodPANASONIC CORP·Filed 2008·Granted May 17, 2011·5 cites·20 claims
- 2879US7550253B2Barrier film material and pattern formation method using the samePANASONIC CORP·Filed 2005·Granted Jun 23, 2009·4 cites·44 claims
- 2979US6342716B1Semiconductor device having dot elements as floating gateMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1999·Granted Jan 29, 2002·47 cites·11 claims
- 3079US5795828AElectroless plating bath used for forming a wiring of a semiconductor device, and method of forming a wiring of a semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1996·Granted Aug 18, 1998·43 cites·9 claims
- 3177USD543279SSyringeTERUMO CORP·Filed 2006·Granted May 22, 2007·22 cites·1 claims
- 3276US6797450B2Radiation-sensitive composition, insulating film and organic EL display elementJSR CORP·Filed 2001·Granted Sep 28, 2004·15 cites·26 claims
- 3376US5677112AProcess for forming a pattern on a semiconductor substrate using a deep ultraviolet absorbent compositionWAKO PURE CHEM IND LTD·Filed 1996·Granted Oct 14, 1997·44 cites·4 claims
- 3475US7125641B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·13 cites·17 claims
- 3575US6872514B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 29, 2005·13 cites·16 claims
- 3675US6017683APattern forming material and pattern forming methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1998·Granted Jan 25, 2000·31 cites·21 claims
- 3774US7125643B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·11 cites·16 claims
- 3874US7094521B2Pattern formation method and exposure systemMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Aug 22, 2006·9 cites·5 claims
- 3973US5965325APattern forming material and pattern forming methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1997·Granted Oct 12, 1999·20 cites·2 claims
- 4072US7071084B2Methods for forming wiring and electrodeINTERNAT CT FOR MATERIALS RES·Filed 2004·Granted Jul 4, 2006·14 cites·11 claims
- 4172US5756242AMethod of forming a resist pattern utilizing correlation between latent image height, resist pattern linewidth and exposure parameterMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1995·Granted May 26, 1998·34 cites·6 claims
- 4271US5389491ANegative working resist compositionMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Feb 14, 1995·24 cites·8 claims
- 4371US4923948ACurable compositionJAPAN SYNTHETIC RUBBER CO LTD·Filed 1988·Granted May 8, 1990·20 cites·7 claims
- 4471US4805000AExposure apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1987·Granted Feb 14, 1989·20 cites·5 claims
- 4570US7871759B2Barrier film material and pattern formation method using the samePANASONIC CORP·Filed 2007·Granted Jan 18, 2011·2 cites·17 claims
- 4670US6511787B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·25 cites·7 claims
- 4770US5432039ARadiation sensitive quinone diazide and resin composition for microlensJAPAN SYNTHETIC RUBBER CO LTD·Filed 1993·Granted Jul 11, 1995·24 cites·15 claims
- 4870US4696800AOzone generating apparatusMITSUBISHI ELECTRIC CORP·Filed 1986·Granted Sep 29, 1987·22 cites·1 claims
- 4968USD543625SSyringeTERUMO CORP·Filed 2006·Granted May 29, 2007·15 cites·1 claims
- 5067US7556914B2Pattern formation methodPANASONIC CORP·Filed 2005·Granted Jul 7, 2009·2 cites·32 claims
Showing the top 50 of 204 patent records by PatentIndex Score.
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