Inventor · disambiguated record
Masaki Enzu
Also filed as: ENZU MASAKI
10 granted patents·8 pending applications·6 citations·filing 2014–2024
79Inventor score
Files withADEKA CORP18
Top patents by PatentIndex Score
18 records- 0193US12104245B2Compound, thin-film forming raw material that contains said compound, and method of manufacturing thin filmADEKA CORP·Filed 2020·Granted Oct 1, 2024·3 cites·5 claims
- 0275US9994593B2Copper compound, starting material for forming thin film, and method for manufacturing thin filmADEKA CORP·Filed 2015·Granted Jun 12, 2018·2 cites·3 claims
- 0374US2025109296A1Thin-film forming raw material used in atomic layer deposition method and method of producing thin-filmADEKA CORP·Filed 2024·Application pending·0 cites
- 0467US10167304B2Ruthenium compound, material for thin film formation, and process for thin film formationADEKA CORP·Filed 2014·Granted Jan 1, 2019·0 cites·7 claims
- 0566US12264168B2Ruthenium compound, thin-film forming raw material, and method of producing thin filmADEKA CORP·Filed 2020·Granted Apr 1, 2025·0 cites·3 claims
- 0662US10253408B2Compound, thin film-forming material, and thin film manufacturing methodADEKA CORP·Filed 2016·Granted Apr 9, 2019·1 cites·10 claims
- 0759US2023151220A1Thin-film forming raw material used in atomic layer deposition method and method of producing thin-filmADEKA CORP·Filed 2021·Application pending·0 cites
- 0857US2018282358A1Alkoxide compound, thin film-forming starting material, thin film formation method, and alcohol compoundADEKA CORP·Filed 2018·Application pending·0 cites
- 0955US10011623B2Alkoxide compound, thin film-forming starting material, and thin film formation methodADEKA CORP·Filed 2015·Granted Jul 3, 2018·0 cites·2 claims
- 1052US2021155638A1Raw material for forming thin film by atomic layer deposition method and method for producing thin filmADEKA CORP·Filed 2019·Application pending·0 cites
- 1151US2023142848A1Zinc compound, thin-film forming raw material, thin-film, and method of producing thin-filmADEKA CORP·Filed 2021·Application pending·0 cites
- 1249US11760771B2Ruthenium compound, raw material for forming thin film, and method for producing thin filmADEKA CORP·Filed 2018·Granted Sep 19, 2023·0 cites·3 claims
- 1349US10920313B2Diazadienyl compound, raw material for forming thin film, and method for manufacturing thin filmADEKA CORP·Filed 2017·Granted Feb 16, 2021·0 cites·4 claims
- 1448US2025019820A1Thin-film forming material for use in atomic layer deposition, thin-film, method of producing thin-film, and ruthenium compoundADEKA CORP·Filed 2022·Application pending·0 cites
- 1546US11408069B2Method for producing metallic ruthenium thin film by atomic layer depositionADEKA CORP·Filed 2019·Granted Aug 9, 2022·0 cites·8 claims
- 1644US10351584B2Alkoxide compound, raw material for forming thin film, method for manufacturing thin film, and alcohol compoundADEKA CORP·Filed 2015·Granted Jul 16, 2019·0 cites·3 claims
- 1740US2017050998A1Cobalt compound, thin film-forming raw material, and method for producing thin filmADEKA CORP·Filed 2015·Application pending·0 cites
- 1834US2018037540A1Diazadienyl compound, raw material for forming thin film, method for producing thin film, and diazadiene compoundADEKA CORP·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →