Inventor · disambiguated record

Masahiro Fukushima

Also filed as: FUKUSHIMA MASAHIRO

67 granted patents·108 pending applications·158 citations·filing 1995–2025

98Inventor score

Technology areasG03F C07C C08F C07D H03H

Files withSHINETSU CHEMICAL CO154 MURATA MANUFACTURING CO9 CANON MEDICAL SYSTEMS CORP7 MITSUBISHI HEAVY IND LTD2 CHUGAI RO CO A CORP OF JAPAN1

Top patents by PatentIndex Score

175 records

0198US9091918B2Sulfonium salt, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2014·Granted Jul 28, 2015·58 cites·19 claims
0296US10915021B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Feb 9, 2021·8 cites·15 claims
0395US11560355B2Onium salt, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Jan 24, 2023·4 cites·24 claims
0494US10323113B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Jun 18, 2019·7 cites·16 claims
0592US11774853B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Oct 3, 2023·5 cites·17 claims
0692US11709427B2Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 25, 2023·2 cites·12 claims
0792US9221742B2Sulfonium salt, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2014·Granted Dec 29, 2015·7 cites·17 claims
0891US10120278B2Carboxylic acid onium salt, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 6, 2018·4 cites·15 claims
0990US11009793B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted May 18, 2021·4 cites·17 claims
1089US9604921B2Sulfonium salt, resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2015·Granted Mar 28, 2017·5 cites·14 claims
1188US10871711B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Dec 22, 2020·2 cites·19 claims
1288US9366958B2Photoacid generator, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Jun 14, 2016·6 cites·11 claims
1387US10023674B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 17, 2018·3 cites·11 claims
1486US10948822B2Resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Mar 16, 2021·2 cites·19 claims
1584US11940728B2Molecular resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2021·Granted Mar 26, 2024·1 cites·8 claims
1684US10845439B2Magnetic resonance imaging apparatus using positional information based on an image obtained by reconstructing a magnetic resonance signalCANON MEDICAL SYSTEMS CORP·Filed 2019·Granted Nov 24, 2020·2 cites·16 claims
1784US9500949B2Chemically-amplified positive resist composition and resist patterning process using the sameSHINETSU CHEMICAL CO·Filed 2015·Granted Nov 22, 2016·3 cites·20 claims
1882US10320362B2Elastic wave deviceMURATA MANUFACTURING CO·Filed 2016·Granted Jun 11, 2019·4 cites·23 claims
1981US9740100B2Hemiacetal compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 22, 2017·2 cites·11 claims
2079US10958240B2Elastic wave deviceMURATA MANUFACTURING CO·Filed 2017·Granted Mar 23, 2021·3 cites·14 claims
2178US10007178B2Positive resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2015·Granted Jun 26, 2018·2 cites·12 claims
2277US12276911B2Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Granted Apr 15, 2025·0 cites·12 claims
2376US2025390019A1Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming methodSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
2475US9122155B2Sulfonium salt, resist composition and patterning processSHINETSU CHEMICAL CO·Filed 2013·Granted Sep 1, 2015·1 cites·18 claims
2575US2025370337A1Onium salt, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
2675US2025355356A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
2775US2025377589A1Onium salt, chemically amplified resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
2875US2025370335A1Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
2974US10591819B2Monomer, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Mar 17, 2020·0 cites·8 claims
3074US2025172870A1Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
3173US10984241B2Medical image diagnosis apparatus and magnetic resonance imaging apparatusCANON MEDICAL SYSTEMS CORP·Filed 2018·Granted Apr 20, 2021·1 cites·20 claims
3273US2025053089A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
3373US2025362605A1Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
3473US2025060669A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
3571US11435666B2Salt compound, chemically amplified resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Sep 6, 2022·1 cites·21 claims
3671US2025388711A1Sulfonium salt monomer, polymer, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
3771US2025085630A1Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
3870US2025020999A1Resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
3970US2025278023A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
4070US2025110400A1Onium salt, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
4170US2025053087A1Onium salt, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
4270US2025270357A1Polymer, chemically amplified negative resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
4369US12498637B2Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Granted Dec 16, 2025·0 cites·11 claims
4469US12422751B2Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Granted Sep 23, 2025·0 cites·12 claims
4569US2025116934A1Onium salt monomer, polymer, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
4669US2023244142A1Polymer, resist composition, and pattern forming methodSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
4769US2025172875A1Polymer, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
4869US2025110405A1Monomer, polymer, chemically amplified resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
4969US2025278020A1Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
5069US2025138425A1Positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites

Showing the top 50 of 175 patent records by PatentIndex Score.

Join the waitlist — get patent alerts

Get an alert when Masahiro Fukushima files or is granted a new patent.

We store only your email — no account needed. See our privacy policy.

Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →