Inventor · disambiguated record
Makoto Hanabata
Also filed as: HANABATA MAKOTO
20 granted patents·481 citations·filing 1980–2008
96Inventor score
Files withSUMITOMO CHEMICAL CO13KANSAI RES INST2KANSAI RES INST INC2KRI INC1NISSAN CHEMICAL IND LTD1
Top patents by PatentIndex Score
20 records- 0195US6534235B1Photosensitive resin composition and process for forming patternKANSAI RES INST INC·Filed 2000·Granted Mar 18, 2003·99 cites·15 claims
- 0292US4812551ANovolak resin for positive photoresistSUMITOMO CHEMICAL CO·Filed 1987·Granted Mar 14, 1989·56 cites·5 claims
- 0390US6653043B1Active particle, photosensitive resin composition, and process for forming patternKANSAI RES INST INC·Filed 2000·Granted Nov 25, 2003·39 cites·23 claims
- 0489US4414230APlastic container improved in barrier properties against gases and water vaporSUMITOMO CHEMICAL CO·Filed 1981·Granted Nov 8, 1983·46 cites·9 claims
- 0583US6478412B1Piezoelectric thin film device, its production method, and ink-jet recording headKANSAI RES INST·Filed 2000·Granted Nov 12, 2002·26 cites·30 claims
- 0679US4414365AProcess for producing an aromatic polyester compositionSUMITOMO CHEMICAL CO·Filed 1982·Granted Nov 8, 1983·29 cites·4 claims
- 0775US6183935B1Inorganic-containing photosensitive resin composition and method for forming inorganic patternKANSAI RES INST·Filed 1998·Granted Feb 6, 2001·37 cites·20 claims
- 0874US7534547B2Optically active compound and photosensitive resin compositionOSAKA GAS CO LTD·Filed 2002·Granted May 19, 2009·9 cites·22 claims
- 0972US4863829APositive type high gamma-value photoresist composition with novolak resin possessingSUMITOMO CHEMICAL CO·Filed 1988·Granted Sep 5, 1989·25 cites·22 claims
- 1067US8344039B2Three-dimensional pattern forming materialNISSAN CHEMICAL IND LTD·Filed 2008·Granted Jan 1, 2013·2 cites·5 claims
- 1167US5059507APositive resist composition containing quinone diazide sulfonic acid ester of a phenol compound and an alkali soluble resinSUMITOMO CHEMICAL CO·Filed 1989·Granted Oct 22, 1991·18 cites·20 claims
- 1263US6921623B2Active components and photosensitive resin composition containing the sameKRI INC·Filed 2001·Granted Jul 26, 2005·9 cites·26 claims
- 1362US5456995ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Oct 10, 1995·14 cites·8 claims
- 1456US5456996ARadiation-sensitive positive resist compositionSUMITOMO CHEMICAL CO·Filed 1994·Granted Oct 10, 1995·12 cites·7 claims
- 1556US4349659AProcess for producing aromatic polyesterSUMITOMO CHEMICAL CO·Filed 1980·Granted Sep 14, 1982·11 cites·7 claims
- 1655US4696886APositive photoresist composition with m-hydroxy-α-methylstyrene homopolymer and quinonediazide compoundSUMITOMO CHEMICAL CO·Filed 1985·Granted Sep 29, 1987·11 cites·2 claims
- 1754US5290656AResist composition, novel phenol compound and quinone diazide sulfonic acid ester of novel phenol compoundSUMITOMO CHEMICAL CO·Filed 1993·Granted Mar 1, 1994·12 cites·10 claims
- 1852US5378586AResist composition comprising a quinone diazide sulfonic diester and a quinone diazide sulfonic complete esterSUMITOMO CHEMICAL CO·Filed 1993·Granted Jan 3, 1995·11 cites·14 claims
- 1948US5124228APositive photoresist composition containing alkali-soluble resin and o-quinone diazide sulfonic acid esterSUMITOMO CHEMICAL CO·Filed 1989·Granted Jun 23, 1992·8 cites·15 claims
- 2045US5861229ARadiation-sensitive positive resist composition comprising a 1,2-quinone diazide compound, an alkali-soluble resin and a polyphenol compoundSUMITOMO CHEMICAL CO·Filed 1992·Granted Jan 19, 1999·7 cites·3 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →