Inventor · disambiguated record
Mark A. Hartney
Also filed as: HARTNEY MARK A
4 granted patents·177 citations·filing 1987–1992
79Inventor score
Top patents by PatentIndex Score
4 records- 0190US5362606APositive resist pattern formation through focused ion beam exposure and surface barrier silylationMASSACHUSETTS INST TECHNOLOGY·Filed 1992·Granted Nov 8, 1994·79 cites·11 claims
- 0287US5318870AMethod of patterning a phenolic polymer film without photoactive additive through exposure to high energy radiation below 225 nm with subsequent organometallic treatment and the associated imaged articleMASSACHUSETTS INST TECHNOLOGY·Filed 1992·Granted Jun 7, 1994·82 cites·6 claims
- 0362US5139925ASurface barrier silylation of novolak film without photoactive additive patterned with 193 nm excimer laserMASSACHUSETTS INST TECHNOLOGY·Filed 1989·Granted Aug 18, 1992·14 cites·3 claims
- 0431US4892617AProcesses involving lithographic materialsAMERICAN TELEPHONE & TELEGRAPH·Filed 1987·Granted Jan 9, 1990·2 cites·6 claims
Join the waitlist — get patent alerts
Get an alert when Mark A. Hartney files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →