Inventor · disambiguated record
Masanobu Hayashi
Also filed as: HAYASHI MASANOBU
9 granted patents·6 pending applications·120 citations·filing 1979–2025
84Inventor score
Files withMERCK PATENT GMBH4HAYASHI MASANOBU3NAGAHARA TATSURO2AZ ELECTRONIC MAT MANUFACTURING JAPAN KK1MURATA MANUFACTURING CO1
Top patents by PatentIndex Score
15 records- 0189US5969952AHybrid IC and electronic device using the sameMURATA MANUFACTURING CO·Filed 1998·Granted Oct 19, 1999·97 cites·6 claims
- 0277US4206619ADyeing apparatusNIPPON DYEING MACHINE MFG CO·Filed 1979·Granted Jun 10, 1980·13 cites·3 claims
- 0369US9896764B2Method for producing siliceous film and polysilazane coating treatment liquid used thereforOZAKI YUKI·Filed 2010·Granted Feb 20, 2018·3 cites·13 claims
- 0463US10000386B2Method for forming of siliceous film and siliceous film formed using sameAZ ELECTRONIC MAT MANUFACTURING JAPAN KK·Filed 2013·Granted Jun 19, 2018·2 cites·4 claims
- 0563US8889229B2Method for formation of siliceous film and siliceous film formed by the methodNAGAHARA TATSURO·Filed 2009·Granted Nov 18, 2014·5 cites·11 claims
- 0662US2024429061A1Method for manufacturing processed substrateMERCK PATENT GMBH·Filed 2024·Application pending·0 cites
- 0758US2025381583A1Method for manufacturing siliceous filmMERCK PATENT GMBH·Filed 2025·Application pending·0 cites
- 0846US2011014796A1Dipping solution for use in production of siliceous film and process for producing siliceous film using the dipping solutionHAYASHI MASANOBU·Filed 2009·Application pending·0 cites
- 0945US8603923B2Dipping solution for use in production of siliceous film and process for producing siliceous film using the dipping solutionHAYASHI MASANOBU·Filed 2013·Granted Dec 10, 2013·0 cites·9 claims
- 1043US9469079B2Film insert molded productOHTSUKA HARUHITO·Filed 2011·Granted Oct 18, 2016·0 cites·3 claims
- 1142US11868048B2Negative type photosensitive siloxane composition and methods for producing cured film and electronic device using the sameMERCK PATENT GMBH·Filed 2018·Granted Jan 9, 2024·0 cites·17 claims
- 1240US11866553B2Polysiloxane, composition comprising the same and cured film using the sameMERCK PATENT GMBH·Filed 2018·Granted Jan 9, 2024·0 cites·18 claims
- 1336US2009305063A1Composition for forming siliceous film and process for producing siliceous film from the sameHAYASHI MASANOBU·Filed 2007·Application pending·0 cites
- 1431US2007059650A1Developing solution for photosensitive composition and method for forming patterned resist filmNAGAHARA TATSUSRO·Filed 2004·Application pending·0 cites
- 1530US2013316515A1Method for producing silicon dioxide filmNAGAHARA TATSURO·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →