Inventor · disambiguated record
Masayuki Hoteida
Also filed as: HOTEIDA MASAYUKI
4 granted patents·5 pending applications·16 citations·filing 2011–2024
68Inventor score
Top patents by PatentIndex Score
9 records- 0185US8963165B2Nitride semiconductor structure, nitride semiconductor light emitting element, nitride semiconductor transistor element, method of manufacturing nitride semiconductor structure, and method of manufacturing nitride semiconductor elementARAKI MASAHIRO·Filed 2011·Granted Feb 24, 2015·11 cites·23 claims
- 0275US11186922B2Apparatus for producing Group-III nitride semiconductor crystal including nitrogen source nozzles with different spray directionsPANASONIC CORP·Filed 2020·Granted Nov 30, 2021·1 cites·2 claims
- 0374US9111839B2Epitaxial wafer for heterojunction type field effect transistorSHARP KK·Filed 2013·Granted Aug 18, 2015·4 cites·2 claims
- 0462US2024271323A1Device and method for producing group iii nitride crystalPANASONIC HOLDINGS CORP·Filed 2024·Application pending·0 cites
- 0559US11879184B2Manufacturing apparatus for a group-III nitride crystal comprising a raw material chamber and a nurturing chamber in which a group III-element oxide gas and a nitrogen element-containing gas react to produce a group-III nitride crystal on a seed substratePANASONIC HOLDINGS CORP·Filed 2022·Granted Jan 23, 2024·0 cites·5 claims
- 0658US2025092565A1Group iii nitride crystal manufacturing apparatus and manufacturing methodPANASONIC HOLDINGS CORP·Filed 2024·Application pending·0 cites
- 0755US2024309551A1Manufacturing device and manufacturing method for group iii nitride crystalPANASONIC HOLDINGS CORP·Filed 2024·Application pending·0 cites
- 0854US2022341056A1Group iii nitride crystal manufacturing apparatus and manufacturing methodPANASONIC HOLDINGS CORP·Filed 2022·Application pending·0 cites
- 0954US2022403547A1Manufacturing apparatus for group-iii compound semiconductor crystalPANASONIC HOLDINGS CORP·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →