Inventor · disambiguated record
Masanao Kamachi
Also filed as: KAMACHI MASANAO
7 granted patents·3 pending applications·4 citations·filing 2008–2018
71Inventor score
Top patents by PatentIndex Score
10 records- 0169US10770224B2Method for forming electrolytic copper plating film on surface of rare earth metal-based permanent magnetHITACHI METALS LTD·Filed 2018·Granted Sep 8, 2020·0 cites·4 claims
- 0266US8163106B2R-Fe-B based sintered magnet having on the surface thereof vapor deposited film of aluminum or alloy thereof, and method for producing the sameKIKUGAWA ATSUSHI·Filed 2008·Granted Apr 24, 2012·4 cites·6 claims
- 0361US9771664B2Method for removing rare earth impurities from nickel-electroplating solutionHITACHI METALS LTD·Filed 2014·Granted Sep 26, 2017·0 cites·3 claims
- 0457US9873953B2Method for removing rare earth impurities from nickel-electroplating solutionHITACHI METALS LTD·Filed 2014·Granted Jan 23, 2018·0 cites·7 claims
- 0553US9695524B2Method for removing rare earth impurities from nickel-electroplating solutionHITACHI METALS LTD·Filed 2012·Granted Jul 4, 2017·0 cites·7 claims
- 0650US9275794B2Corrosion-resistant magnet and method for producing the sameKIKUGAWA ATSUSHI·Filed 2009·Granted Mar 1, 2016·0 cites·1 claims
- 0746US9267217B2Production method for R—Fe—B based sintered magnet having plating film on surface thereofKAMACHI MASANAO·Filed 2012·Granted Feb 23, 2016·0 cites·3 claims
- 0846US2018096762A1Sintered r-tm-b magnetHITACHI METALS LTD·Filed 2017·Application pending·0 cites
- 0942US2013180860A1Method for forming electrolytic copper plating film on surface of rare earth metal-based permanent magnetKAMACHI MASANAO·Filed 2011·Application pending·0 cites
- 1041US2018025818A1Sintered r-tm-b magnetHITACHI METALS LTD·Filed 2016·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Masanao Kamachi files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →