Inventor · disambiguated record
Masahiro Kanayama
Also filed as: KANAYAMA MASAHIRO
9 granted patents·3 pending applications·63 citations·filing 1983–2023
82Inventor score
Files withSHINETSU CHEMICAL CO8KANAYAMA MASAHIRO1MITSUBISHI PLASTICS INC1NIHON NOHYAKU CO LTD1TANIGUCHI RYOSUKE1
Top patents by PatentIndex Score
12 records- 0195US11385544B2Composition for forming silicon-containing resist underlayer film and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Jul 12, 2022·4 cites·20 claims
- 0285US12332565B2Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning processSHINETSU CHEMICAL CO·Filed 2023·Granted Jun 17, 2025·0 cites·12 claims
- 0383US4581946AInstrumental error compensation circuit for flow meterKANAYAMA MASAHIRO·Filed 1983·Granted Apr 15, 1986·52 cites·6 claims
- 0480US11480879B2Composition for forming silicon-containing resist underlayer film and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Oct 25, 2022·1 cites·12 claims
- 0571US6720288B1Herbicidal compositions and method of using the sameNIHON NOHYAKU CO LTD·Filed 2000·Granted Apr 13, 2004·6 cites·11 claims
- 0670US12174541B2Composition for forming silicon-containing resist underlayer film and patterning processSHINETSU CHEMICAL CO·Filed 2023·Granted Dec 24, 2024·0 cites·4 claims
- 0759US12085857B2Composition for forming silicon-containing resist underlayer film and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Sep 10, 2024·0 cites·14 claims
- 0857US11914295B2Thermosetting iodine- and silicon-containing material, composition containing the material for forming resist underlayer film for EUV lithography, and patterning processSHINETSU CHEMICAL CO·Filed 2019·Granted Feb 27, 2024·0 cites·23 claims
- 0953US11592287B2Method for measuring distance of diffusion of curing catalystSHINETSU CHEMICAL CO·Filed 2020·Granted Feb 28, 2023·0 cites·4 claims
- 1044US2008136998A1Light-Reflecting Material and Method for Manufacturing Light-Reflecting MaterialMITSUBISHI PLASTICS INC·Filed 2005·Application pending·0 cites
- 1141US2013280912A1Silicon compound, silicon-containing compound, composition for forming resist underlayer film containing the same and patterning processSHINETSU CHEMICAL CO·Filed 2013·Application pending·0 cites
- 1235US2013101936A1Positive resist composition and patterning processTANIGUCHI RYOSUKE·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →