Inventor · disambiguated record
Masaharu Kawakubo
Also filed as: KAWAKUBO MASAHARU
16 granted patents·1 pending application·629 citations·filing 1995–2006
95Inventor score
Top patents by PatentIndex Score
17 records- 0196US6876946B2Alignment method and apparatus thereforNIKON CORP·Filed 2002·Granted Apr 5, 2005·80 cites·25 claims
- 0293US6278957B1Alignment method and apparatus thereforNIKON CORP·Filed 1999·Granted Aug 21, 2001·116 cites·8 claims
- 0392US5989761AExposure methods for overlaying one mask pattern on anotherNIKON CORP·Filed 1999·Granted Nov 23, 1999·79 cites·28 claims
- 0489US5654553AProjection exposure apparatus having an alignment sensor for aligning a mask image with a substrateNIKON CORP·Filed 1996·Granted Aug 5, 1997·81 cites·31 claims
- 0582US6163366AExposure method and apparatusNIKON CORP·Filed 1997·Granted Dec 19, 2000·53 cites·55 claims
- 0681US5561606AMethod for aligning shot areas on a substrateNIKON CORP·Filed 1995·Granted Oct 1, 1996·48 cites·26 claims
- 0780US5863680AExposure method utilizing alignment of superimposed layersNIKON CORP·Filed 1996·Granted Jan 26, 1999·43 cites·8 claims
- 0879US6219130B1Position detecting apparatusNIKON CORP·Filed 2000·Granted Apr 17, 2001·20 cites·19 claims
- 0975US8130362B2Correction method and exposure apparatusKAWAKUBO MASAHARU·Filed 2005·Granted Mar 6, 2012·5 cites·25 claims
- 1070US7817242B2Exposure method and device manufacturing method, exposure apparatus, and programNIKON CORP·Filed 2004·Granted Oct 19, 2010·15 cites·19 claims
- 1168US6141107AApparatus for detecting a position of an optical markNIKON CORP·Filed 1995·Granted Oct 31, 2000·27 cites·29 claims
- 1267US6100987APosition detecting apparatusNIKON CORP·Filed 1997·Granted Aug 8, 2000·30 cites·21 claims
- 1364US8605248B2Exposure method and lithography systemKAWAKUBO MASAHARU·Filed 2006·Granted Dec 10, 2013·2 cites·16 claims
- 1456US6372395B2Exposure method for overlaying one mask pattern on anotherNIKON CORP·Filed 2001·Granted Apr 16, 2002·3 cites·12 claims
- 1556US6331369B1Exposure methods for overlaying one mask pattern on anotherNIKON CORP·Filed 1999·Granted Dec 18, 2001·12 cites·26 claims
- 1654US5760411AAlignment method for positioning a plurality of shot areas on a substrateNIKON CORP·Filed 1996·Granted Jun 2, 1998·15 cites·10 claims
- 1740US2001049589A1Alignment method and apparatus thereforNIKON CORP·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →