Inventor · disambiguated record
Masafumi Kojima
Also filed as: KOJIMA Masafumi
17 granted patents·34 pending applications·17 citations·filing 2015–2025
88Inventor score
Files withFUJIFILM CORP51
Top patents by PatentIndex Score
51 records- 0192US10802399B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2018·Granted Oct 13, 2020·5 cites·20 claims
- 0286US12032288B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Granted Jul 9, 2024·1 cites·7 claims
- 0384US9996003B2Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Jun 12, 2018·4 cites·19 claims
- 0482US11067890B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Granted Jul 20, 2021·2 cites·12 claims
- 0579US2025347997A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 0676US10018913B2Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Jul 10, 2018·2 cites·17 claims
- 0775US10025186B2Active-light-sensitive or radiation-sensitive resin composition, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2017·Granted Jul 17, 2018·2 cites·12 claims
- 0872US2025244670A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 0970US10303058B2Pattern forming method, treating agent, electronic device, and method for manufacturing the sameFUJIFILM CORP·Filed 2016·Granted May 28, 2019·1 cites·8 claims
- 1069US2024402601A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, and compoundFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 1169US2024337931A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for producing electronic device, and compoundsFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 1267US2024329524A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 1367US2023139009A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 1466US2025199404A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2025·Application pending·0 cites
- 1566US2024427242A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 1664US2024152049A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1764US2024061331A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and compoundFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 1863US2023004086A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 1962US2023133710A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 2062US2023043143A1Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 2162US2025291250A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for producing electronic deviceFUJIFILM CORP·Filed 2024·Application pending·0 cites
- 2261US12007688B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, method for manufacturing electronic device, and resinFUJIFILM CORP·Filed 2020·Granted Jun 11, 2024·0 cites·20 claims
- 2361US2023185192A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 2458US11886113B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Jan 30, 2024·0 cites·15 claims
- 2558US2023375925A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, compound, and resinFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 2658US2023236502A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 2758US2023367210A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 2858US2023259029A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2023·Application pending·0 cites
- 2957US12422752B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Granted Sep 23, 2025·0 cites·20 claims
- 3056US12481215B2Active-light-sensitive or radiation-sensitive resin composition, resist film, pattern formation method, method for manufacturing electronic device, compound, and resinFUJIFILM CORP·Filed 2022·Granted Nov 25, 2025·0 cites·15 claims
- 3156US12216404B2Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2020·Granted Feb 4, 2025·0 cites·5 claims
- 3256US2022334476A1Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2022·Application pending·0 cites
- 3355US2021364917A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 3454US2021286263A1Active ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 3552US2022082938A1Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, resist film, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 3652US2022043347A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 3752US2021294217A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2021·Application pending·0 cites
- 3849US9791777B2Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Oct 17, 2017·0 cites·12 claims
- 3947US11073762B2Actinic ray-sensitive or radiation sensitive resin composition, actinic raysensitive or radiation-sensitive film, pattern forming method, method for manufacturing electronic device, and photoacid generatorFUJIFILM CORP·Filed 2019·Granted Jul 27, 2021·0 cites·9 claims
- 4046US9841679B2Actinic ray-sensitive or radiation-sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Dec 12, 2017·0 cites·15 claims
- 4144US2019196326A1Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method of manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 4242US10234759B2Actinic-ray- or radiation-sensitive resin composition, actinic-ray- or radiation-sensitive film and method of forming patternFUJIFILM CORP·Filed 2015·Granted Mar 19, 2019·0 cites·12 claims
- 4342US2019294042A1Actinic ray-sensitive or radiation-sensitive resin composition, actinic ray-sensitive or radiation-sensitive film, pattern forming method, and method for manufacturing electronic deviceFUJIFILM CORP·Filed 2019·Application pending·0 cites
- 4437US2017192355A1Method for forming negative tone pattern, method for manufacturing electronic device, and active-light-sensitive or radiation-sensitive resin compositionFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 4537US2016349613A1Active light sensitive or radiation sensitive resin composition, pattern forming method, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 4637US2017199455A1Method for forming negative tone pattern, method for manufacturing electronic device, and active-light-sensitive or radiation-sensitive resin compositionFUJIFILM CORP·Filed 2017·Application pending·0 cites
- 4736US9952509B2Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Granted Apr 24, 2018·0 cites·6 claims
- 4836US2017059995A1Pattern forming method, active light sensitive or radiation sensitive resin composition, active light sensitive or radiation sensitive film, method for manufacturing electronic device, and electronic deviceFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 4934US2016195814A1Pattern formation method, electronic-device production method, and processing agentFUJIFILM CORP·Filed 2016·Application pending·0 cites
- 5034US2016048082A1Pattern-forming method, electronic device and method for producing same, and developing fluidFUJIFILM CORP·Filed 2015·Application pending·0 cites
Showing the top 50 of 51 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Masafumi Kojima files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →