Inventor · disambiguated record

Masaaki Kotake

Also filed as: KOTAKE MASAAKI

17 granted patents·33 pending applications·35 citations·filing 2016–2025

89Inventor score

Technology areasG03F C07C C08F C09D H10P

Files withSHINETSU CHEMICAL CO50

Top patents by PatentIndex Score

50 records

0196US10120279B2Negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Nov 6, 2018·8 cites·13 claims
0294US9720323B2Chemically amplified positive resist composition and pattern forming processSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 1, 2017·11 cites·12 claims
0392US9969829B2Polymer compound, negative resist composition, laminate, patterning process, and compoundSHINETSU CHEMICAL CO·Filed 2017·Granted May 15, 2018·3 cites·20 claims
0492US9740098B2Chemically amplified negative resist composition using novel onium salt and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2016·Granted Aug 22, 2017·5 cites·13 claims
0587US11231650B2Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Jan 25, 2022·3 cites·17 claims
0682US10725377B2Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Jul 28, 2020·2 cites·17 claims
0780US11548844B2Monomer, polymer, negative resist composition, photomask blank, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Jan 10, 2023·1 cites·10 claims
0877US11429023B2Onium salt, negative resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Aug 30, 2022·1 cites·18 claims
0975US2025355356A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
1073US10416558B2Positive resist composition, resist pattern forming process, and photomask blankSHINETSU CHEMICAL CO·Filed 2017·Granted Sep 17, 2019·1 cites·12 claims
1173US2025053089A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
1272US2024219836A1Conductive Polymer Composition, Coated Product, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
1370US2025278023A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
1470US2025110400A1Onium salt, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
1570US2025270357A1Polymer, chemically amplified negative resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
1669US2025264802A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
1769US2024427241A1Monomer, polymer, chemically amplified negative resist composition, and pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
1869US2025068067A1Onium salt, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
1968US2024280900A1Onium salt, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
2068US2024329532A1Acetal modifier, polymer, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
2167US2024377738A1Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
2267US2025028244A1Acetal modifier, polymer, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
2367US2024402599A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
2467US2025004371A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
2567US2024377741A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
2667US2024385517A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
2766US2024329522A1Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2024·Application pending·0 cites
2864US2024118613A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
2964US2024134280A1Polymer, Chemically Amplified Positive Resist Composition, Resist Patterning Process, And Mask BlankSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
3063US2023393465A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
3163US2023393461A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
3263US2023393470A1Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
3363US2023367214A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
3463US2023367213A1Mask blank, resist pattern forming process and chemically amplified positive resist compositionSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
3563US2022197140A1Alcohol compound, chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2021·Application pending·0 cites
3663US2023418158A1Novel Sulfonium Salt, Resist Composition, And Patterning ProcessSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
3763US2023393466A1Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
3862US2023341775A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
3961US12164227B2Chemically amplified negative resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Granted Dec 10, 2024·0 cites·13 claims
4061US12164231B2Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Granted Dec 10, 2024·0 cites·12 claims
4161US11124477B2Sulfonium compound, positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2019·Granted Sep 21, 2021·0 cites·15 claims
4261US2023194986A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
4360US12429772B2Chemically amplified resist composition, photomask blank, method for forming resist pattern, and method for producing polymer compoundSHINETSU CHEMICAL CO·Filed 2022·Granted Sep 30, 2025·0 cites·13 claims
4458US2024094635A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2023·Application pending·0 cites
4558US2022308451A1Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2022·Application pending·0 cites
4656US2025271760A1Sulfonium salt monomer, polymer, chemically amplified positive resist composition, and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2025·Application pending·0 cites
4752US11852974B2Conductive polymer composition, coated product and patterning processSHINETSU CHEMICAL CO·Filed 2020·Granted Dec 26, 2023·0 cites·11 claims
4844US11131926B2Resist composition and resist patterning processSHINETSU CHEMICAL CO·Filed 2018·Granted Sep 28, 2021·0 cites·18 claims
4943US10495969B2Chemically amplified positive resist composition and resist pattern forming processSHINETSU CHEMICAL CO·Filed 2017·Granted Dec 3, 2019·0 cites·12 claims
5040US9944738B2Polymer compound, positive resist composition, laminate, and resist patterning processSHINETSU CHEMICAL CO·Filed 2016·Granted Apr 17, 2018·0 cites·20 claims

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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →