Inventor · disambiguated record
Man-Young Lee
Also filed as: LEE MAN SU · LEE MAN-YOUNG
5 granted patents·5 pending applications·37 citations·filing 1991–2006
77Inventor score
Top patents by PatentIndex Score
10 records- 0162US7166183B2Apparatus and method for treating edge of substrateSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Jan 23, 2007·10 cites·19 claims
- 0245US7434589B2Wafer cleaning apparatus with anticipating malfunction of pumpSAMSUNG ELECTRONICS CO LTD·Filed 2004·Granted Oct 14, 2008·1 cites·8 claims
- 0344US6742281B2Apparatus for drying semiconductor wafer using vapor dry methodSAMSUNG ELECTRONICS CO LTD·Filed 2003·Granted Jun 1, 2004·2 cites·19 claims
- 0444US5227992AOperational method and apparatus over GF(2m) using a subfield GF(2.sup.SAMSUNG ELECTRONICS CO LTD·Filed 1991·Granted Jul 13, 1993·15 cites·15 claims
- 0540US5315601AError correction method and apparatus thereofSAMSUNG ELECTRONICS CO LTD·Filed 1991·Granted May 24, 1994·9 cites·3 claims
- 0639US2006162748A1Wafer guide and semiconductor wafer drying apparatus using the sameLEE JONG-JAE·Filed 2006·Application pending·0 cites
- 0739US2006174913A1Apparatus for and method of wet processing semiconductor substratesJUNG DONG-HOON·Filed 2006·Application pending·0 cites
- 0836US2005139240A1Rinsing and drying apparatus having rotatable nozzles and methods of rinsing and drying semiconductor wafers using the sameFiled 2004·Application pending·0 cites
- 0934US2007081886A1System and method for transferring and aligning wafersMYOUNG YOUNG-KWANG·Filed 2006·Application pending·0 cites
- 1024US2003219361A1Apparatus and method for pretreating effluent gases in a wet environmentUNISEM CO LTD·Filed 2003·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Man-Young Lee files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →