Inventor · disambiguated record
Masaki Mikami
Also filed as: MIKAMI MASAKI
16 granted patents·1 pending application·267 citations·filing 1999–2017
93Inventor score
Top patents by PatentIndex Score
17 records- 0195US7906259B2Reflective mask blank for EUV lithographyASAHI GLASS CO LTD·Filed 2008·Granted Mar 15, 2011·27 cites·28 claims
- 0288US7833682B2Reflective mask blank for EUV lithography and substrate with functional film for the sameASAHI GLASS CO LTD·Filed 2008·Granted Nov 16, 2010·15 cites·17 claims
- 0385US9423684B2Reflective mask blank for EUV lithography and process for its productionASAHI GLASS CO LTD·Filed 2014·Granted Aug 23, 2016·6 cites·17 claims
- 0484US8828626B2Substrate with reflective layer for EUV lithography and reflective mask blank for EUV lithographyASAHI GLASS CO LTD·Filed 2012·Granted Sep 9, 2014·5 cites·20 claims
- 0584US7736821B2Reflective mask blank for EUV lithography and substrate with a conductive film for the mask blankASAHI GLASS CO LTD·Filed 2006·Granted Jun 15, 2010·10 cites·14 claims
- 0683US8088538B2Reflective mask blank for EUV lithographyHAYASHI KAZYUKI·Filed 2009·Granted Jan 3, 2012·12 cites·16 claims
- 0781US9052601B2Reflective mask blank for EUV lithography and process for its production, as well as substrate with reflective layer for such mask blank and process for its productionASAHI GLASS CO LTD·Filed 2013·Granted Jun 9, 2015·3 cites·28 claims
- 0880US9207529B2Reflective mask blank for EUV lithography, and process for its productionASAHI GLASS CO LTD·Filed 2013·Granted Dec 8, 2015·4 cites·22 claims
- 0979US9720316B2Reflective mask blank for EUV lithography and process for its production, as well as substrate with reflective layer for such mask blank and process for its productionASAHI GLASS CO LTD·Filed 2015·Granted Aug 1, 2017·2 cites·18 claims
- 1079US8927179B2Optical member for EUV lithography, and process for production of reflective layer-equipped substrateMIKAMI MASAKI·Filed 2012·Granted Jan 6, 2015·5 cites·20 claims
- 1175US8580465B2Multilayer mirror for EUV lithography and process for its productionMIKAMI MASAKI·Filed 2012·Granted Nov 12, 2013·2 cites·11 claims
- 1274US8993201B2Reflective layer-equipped substrate for EUV lithography, reflective mask blank for EUV lithography, reflective mask for EUV lithography, and process for production of the reflective layer-equipped substrateMIKAMI MASAKI·Filed 2012·Granted Mar 31, 2015·2 cites·20 claims
- 1367US8986910B2Optical member for EUV lithographyMIKAMI MASAKI·Filed 2012·Granted Mar 24, 2015·1 cites·20 claims
- 1463US6678866B1Notification information display apparatus notification information display system and recording mediumHAKUHODO INC·Filed 1999·Granted Jan 13, 2004·173 cites·24 claims
- 1552US9448469B2Reflective mask blank for EUV lithography, or reflective layer-coated substrate for EUV lithography, and process for its productionASAHI GLASS CO LTD·Filed 2014·Granted Sep 20, 2016·0 cites·20 claims
- 1632US2002146594A1Magnetic recording medium and production method thereof and magenetic recording deviceMIGAKU TAKAHASHI·Filed 2002·Application pending·0 cites
- 1730US10775692B2Method for manufacturing multilayer film-deposited substrate and multilayer film-deposited substrateAGC INC·Filed 2017·Granted Sep 15, 2020·0 cites·11 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →