Inventor · disambiguated record
Masayuki Nakatsu
Also filed as: NAKATSU MASAYUKI
7 granted patents·3 pending applications·40 citations·filing 2001–2023
81Inventor score
Files withSHINETSU CHEMICAL CO3HONDA MOTOR CO LTD1LEIGH BENJAMIN DAVID1NIKON CORP1SHIN ESTU CHEMICAL CO LTD1
Top patents by PatentIndex Score
10 records- 0170USD461249SMagnetic field generating device for use in MRISUMITOMO SPEC METALS·Filed 2001·Granted Aug 6, 2002·17 cites·1 claims
- 0268US7344808B2Method of making photomask blank substratesSHINETSU CHEMICAL CO·Filed 2004·Granted Mar 18, 2008·10 cites·5 claims
- 0365US7351504B2Photomask blank substrate, photomask blank and photomaskSHINETSU CHEMICAL CO·Filed 2004·Granted Apr 1, 2008·8 cites·7 claims
- 0461US8812067B2Multi orientation cryostatsLEIGH BENJAMIN DAVID·Filed 2012·Granted Aug 19, 2014·2 cites·22 claims
- 0560US2024110113A1Method for producing gasoline alternative and gasoline alternativeHONDA MOTOR CO LTD·Filed 2023·Application pending·0 cites
- 0651US2015065780A1Multi Orientation CryostatsTESLA ENGINEERING LTD·Filed 2014·Application pending·0 cites
- 0750US7179567B2Phase shift mask blank, phase shift mask, and method of manufactureSHINETSU CHEMICAL CO·Filed 2003·Granted Feb 20, 2007·3 cites·15 claims
- 0838US7329475B2Method of selecting photomask blank substratesSHIN ESTU CHEMICAL CO LTD·Filed 2004·Granted Feb 12, 2008·0 cites·2 claims
- 0938US7070888B2Method of selecting photomask blank substratesNIKON CORP·Filed 2004·Granted Jul 4, 2006·0 cites·6 claims
- 1035US2003025216A1Phase shift mask blank, phase shift mask, and method of manufactureFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →