Inventor · disambiguated record
Martha M. Rajaratnam
Also filed as: RAJARATNAM MARTHA M
8 granted patents·2 pending applications·351 citations·filing 1991–2014
90Inventor score
Top patents by PatentIndex Score
10 records- 0196US7922824B2Oxidizing aqueous cleaner for the removal of post-etch residuesADVANCED TECH MATERIALS·Filed 2006·Granted Apr 12, 2011·57 cites·20 claims
- 0293US5731364APhotoimageable compositions comprising multiple arylsulfonium photoactive compoundsSHIPLEY CO LLC·Filed 1996·Granted Mar 24, 1998·70 cites·24 claims
- 0388US5344742ABenzyl-substituted photoactive compounds and photoresist compositions comprising sameSHIPLEY CO·Filed 1993·Granted Sep 6, 1994·78 cites·28 claims
- 0486US6048672APhotoresist compositions and methods and articles of manufacture comprising sameSHIPLEY CO LLC·Filed 1998·Granted Apr 11, 2000·61 cites·19 claims
- 0586US5258257ARadiation sensitive compositions comprising polymer having acid labile groupsSHIPLEY CO·Filed 1991·Granted Nov 2, 1993·51 cites·34 claims
- 0684US8765654B2Oxidizing aqueous cleaner for the removal of post-etch residuesMINSEK DAVID W·Filed 2011·Granted Jul 1, 2014·5 cites·18 claims
- 0776US5362600ARadiation sensitive compositions comprising polymer having acid labile groupsSHIPLEY CO·Filed 1993·Granted Nov 8, 1994·27 cites·19 claims
- 0875US9443713B2Oxidizing aqueous cleaner for the removal of post-etch residuesADVANCED TECH MATERIALS·Filed 2014·Granted Sep 13, 2016·2 cites·15 claims
- 0940US2009032766A1Composition and method for selectively etching gate spacer oxide materialADVANCED TECH MATERIALS·Filed 2006·Application pending·0 cites
- 1035US2002012869A1Positive photoresists containing crosslinked polymersSHIPLEY CO LLC·Filed 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →