Inventor · disambiguated record
Masamichi Sakaguchi
Also filed as: SAKAGUCHI MASAMICHI
12 granted patents·13 pending applications·56 citations·filing 2001–2022
88Inventor score
Files withHITACHI HIGH TECH CORP5E THERMOGENTEK CO LTD3HITACHI LTD3ISHIHARA MASUNORI2NAKAUNE KOICHI2
Top patents by PatentIndex Score
25 records- 0174US6919274B2LSI device etching method and apparatus thereofHITACHI HIGH TECH CORP·Filed 2004·Granted Jul 19, 2005·18 cites·13 claims
- 0271US8216420B2Plasma processing apparatusKAZUMI HIDEYUKI·Filed 2006·Granted Jul 10, 2012·4 cites·5 claims
- 0370US6620737B2Plasma etching methodHITACHI LTD·Filed 2001·Granted Sep 16, 2003·13 cites·9 claims
- 0464US6617255B2Plasma processing method for working the surface of semiconductor devicesHITACHI LTD·Filed 2001·Granted Sep 9, 2003·7 cites·3 claims
- 0563US6709984B2Method for manufacturing semiconductor deviceHITACHI HIGH TECH CORP·Filed 2002·Granted Mar 23, 2004·9 cites·2 claims
- 0660US7909933B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2009·Granted Mar 22, 2011·1 cites·5 claims
- 0757US7913646B2Vacuum processing apparatus and vacuum processing methodHITACHI HIGH TECH CORP·Filed 2008·Granted Mar 29, 2011·1 cites·4 claims
- 0852US8262801B2Vacuum processing methodKITAOKA KEN·Filed 2010·Granted Sep 11, 2012·1 cites·4 claims
- 0950US7098138B2Plasma processing method for working the surface of semiconductor devicesHITACHI LTD·Filed 2003·Granted Aug 29, 2006·2 cites·2 claims
- 1049US2006048892A1Plasma processing method for working the surface of semiconductor devicesARASE TAKAO·Filed 2005·Application pending·0 cites
- 1147US8143175B2Dry etching methodUNE SATOSHI·Filed 2009·Granted Mar 27, 2012·0 cites·8 claims
- 1247US2024180035A1Thermoelectric power generation systemE THERMOGENTEK CO LTD·Filed 2022·Application pending·0 cites
- 1347US2009065479A1Dry etching method of high-k filmNAKAUNE KOICHI·Filed 2008·Application pending·0 cites
- 1445US2010178415A1Method for seasoning plasma processing apparatus, and method for determining end point of seasoningHITACHI HIGH TECH CORP·Filed 2009·Application pending·0 cites
- 1543US2008216865A1Plasma Processing MethodISHIHARA MASUNORI·Filed 2007·Application pending·0 cites
- 1642US2011171833A1Dry etching method of high-k filmNAKAUNE KOICHI·Filed 2011·Application pending·0 cites
- 1742US2022238778A1Tubular heat exchanger with thermoelectric power generation function and its manufacturing method and thermoelectric power generation device using the sameE THERMOGENTEK CO LTD·Filed 2020·Application pending·0 cites
- 1841US2008112780A1Vacuum processing apparatusMATANO KATSUJI·Filed 2007·Application pending·0 cites
- 1941US2009081872A1Plasma etching method for etching sampleKOBAYASHI HITOSHI·Filed 2008·Application pending·0 cites
- 2040US8277563B2Plasma processing methodISHIHARA MASUNORI·Filed 2011·Granted Oct 2, 2012·0 cites·8 claims
- 2139US2007218696A1Dry etching methodKUWABARA KENICHI·Filed 2006·Application pending·0 cites
- 2239US2007207618A1Dry etching methodUNE SATOSHI·Filed 2006·Application pending·0 cites
- 2336US2004048477A1Method for manufacturing semiconductor deviceFiled 2003·Application pending·0 cites
- 2435US2024147857A1Thermoelectric power generation systemE THERMOGENTEK CO LTD·Filed 2021·Application pending·0 cites
- 2534US8486291B2Plasma processing methodOHMORI TAKESHI·Filed 2011·Granted Jul 16, 2013·0 cites·9 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →