Inventor · disambiguated record
Masaru Sasago
Also filed as: SASAGO MASARU
153 granted patents·59 pending applications·1,013 citations·filing 1985–2019
99Inventor score
Files withMATSUSHITA ELECTRIC INDUSTRIAL CO LTD115PANASONIC CORP38SHINETSU CHEMICAL CO25CENTRAL GLASS CO LTD11ENDO MASAYUKI7
Top patents by PatentIndex Score
212 records- 0196US4745042AWater-soluble photopolymer and method of forming pattern by use of the sameMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1985·Granted May 17, 1988·95 cites·12 claims
- 0294US7754330B2Organic silicon oxide core-shell particles and preparation method thereof, porous film-forming composition, porous film and formation method thereof, and semiconductor deviceSHINETSU CHEMICAL CO·Filed 2009·Granted Jul 13, 2010·24 cites·4 claims
- 0394US7195860B2Semiconductor manufacturing apparatus and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Mar 27, 2007·47 cites·11 claims
- 0491US7923522B2Process for preparing a dispersion liquid of zeolite fine particlesSHINETSU CHEMICAL CO·Filed 2008·Granted Apr 12, 2011·17 cites·11 claims
- 0590US7405459B2Semiconductor device comprising porous filmSHINETSU CHEMICAL CO·Filed 2007·Granted Jul 29, 2008·13 cites·4 claims
- 0688US9291889B2Photo mask and method for forming pattern using the samePANASONIC CORP·Filed 2014·Granted Mar 22, 2016·9 cites·16 claims
- 0788US8067148B2Pattern forming methodENDOU MASAYUKI·Filed 2010·Granted Nov 29, 2011·12 cites·15 claims
- 0888US7488567B2Polymer, resist composition and patterning processPANASONIC CORP·Filed 2006·Granted Feb 10, 2009·9 cites·20 claims
- 0987US7666967B2Ester compound, polymer, resist composition, and patterning processSHINETSU CHEMICAL CO·Filed 2006·Granted Feb 23, 2010·5 cites·4 claims
- 1083US6875556B2Resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Apr 5, 2005·20 cites·9 claims
- 1183US6710148B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2002·Granted Mar 23, 2004·20 cites·20 claims
- 1283US4841341AIntegrator for an exposure apparatus or the likeMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1987·Granted Jun 20, 1989·34 cites·14 claims
- 1382US7713685B2Exposure system and pattern formation methodPANASONIC CORP·Filed 2005·Granted May 11, 2010·5 cites·20 claims
- 1482US6949329B2Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Sep 27, 2005·20 cites·9 claims
- 1582US4849323APattern forming method using contrast enhanced materialMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1987·Granted Jul 18, 1989·15 cites·3 claims
- 1681US7914953B2Photomask and pattern formation method using the samePANASONIC CORP·Filed 2008·Granted Mar 29, 2011·5 cites·19 claims
- 1780US7731862B2Dry etching method, fine structure formation method, mold and mold fabrication methodPANASONIC CORP·Filed 2006·Granted Jun 8, 2010·9 cites·27 claims
- 1880US7455950B2Resist material and pattern formation method using the samePANASONIC CORP·Filed 2007·Granted Nov 25, 2008·4 cites·11 claims
- 1980US4724466AExposure apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1987·Granted Feb 9, 1988·29 cites·13 claims
- 2079US7947432B2Pattern formation methodPANASONIC CORP·Filed 2007·Granted May 24, 2011·4 cites·28 claims
- 2179US7943285B2Pattern formation methodPANASONIC CORP·Filed 2008·Granted May 17, 2011·5 cites·20 claims
- 2279US7550253B2Barrier film material and pattern formation method using the samePANASONIC CORP·Filed 2005·Granted Jun 23, 2009·4 cites·44 claims
- 2378US7402621B2Porous-film-forming composition, preparation method of the composition, porous film and semiconductor deviceSHINETSU CHEMICAL CO·Filed 2005·Granted Jul 22, 2008·7 cites·6 claims
- 2477US7919005B2Dry etching method, fine structure formation method, mold and mold fabrication methodPANASONIC CORP·Filed 2006·Granted Apr 5, 2011·4 cites·18 claims
- 2576US7906030B2Dry etching method, fine structure formation method, mold and mold fabrication methodPANASONIC CORP·Filed 2006·Granted Mar 15, 2011·4 cites·18 claims
- 2676US5252435AMethod for forming patternMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1991·Granted Oct 12, 1993·32 cites·6 claims
- 2775US7125641B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·13 cites·17 claims
- 2875US7084505B2Porous film, composition and manufacturing method, interlayer dielectric film, and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Aug 1, 2006·14 cites·8 claims
- 2975US6872514B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2003·Granted Mar 29, 2005·13 cites·16 claims
- 3074US7758761B2Dry etching method, fine structure formation method, mold and mold fabrication methodPANASONIC CORP·Filed 2006·Granted Jul 20, 2010·4 cites·33 claims
- 3174US7125643B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Oct 24, 2006·11 cites·16 claims
- 3274US7119354B2Composition for forming porous film, porous film and method for forming the same, interlevel insulator filmMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Oct 10, 2006·13 cites·8 claims
- 3374US7094521B2Pattern formation method and exposure systemMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Aug 22, 2006·9 cites·5 claims
- 3471US7132473B2Composition for forming porous film, porous film and method for forming the same, interlevel insulator film, and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2003·Granted Nov 7, 2006·11 cites·3 claims
- 3571US4805000AExposure apparatusMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1987·Granted Feb 14, 1989·20 cites·5 claims
- 3670US9046783B2Photomask, and pattern formation method and exposure apparatus using the photomaskPANASONIC CORP·Filed 2013·Granted Jun 2, 2015·1 cites·25 claims
- 3770US7871759B2Barrier film material and pattern formation method using the samePANASONIC CORP·Filed 2007·Granted Jan 18, 2011·2 cites·17 claims
- 3870US6528240B1Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2000·Granted Mar 4, 2003·10 cites·17 claims
- 3970US6511787B2Polymers, resist compositions and patterning processSHINETSU CHEMICAL CO·Filed 2001·Granted Jan 28, 2003·25 cites·7 claims
- 4068US7294571B2Concave pattern formation method and method for forming semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Nov 13, 2007·3 cites·10 claims
- 4168US6930393B2Composition for forming porous film, porous film and method for forming the same, interlayer insulator film, and semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted Aug 16, 2005·12 cites·12 claims
- 4267US7556914B2Pattern formation methodPANASONIC CORP·Filed 2005·Granted Jul 7, 2009·2 cites·32 claims
- 4367US7378216B2Resist material and pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted May 27, 2008·2 cites·22 claims
- 4467US7378229B2Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2004·Granted May 27, 2008·8 cites·9 claims
- 4567US6764811B2Pattern formation methodMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2002·Granted Jul 20, 2004·8 cites·9 claims
- 4666US7067231B2Polymers, resist compositions and patterning processCENTRAL GLASS CO LTD·Filed 2004·Granted Jun 27, 2006·19 cites·7 claims
- 4765US7291554B2Method for forming semiconductor deviceMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 2005·Granted Nov 6, 2007·3 cites·40 claims
- 4865US5401932AMethod of producing a stencil maskMATSUSHITA ELECTRIC INDUSTRIAL CO LTD·Filed 1993·Granted Mar 28, 1995·23 cites·10 claims
- 4964US7939242B2Barrier film material and pattern formation method using the samePANASONIC CORP·Filed 2008·Granted May 10, 2011·1 cites·25 claims
- 5064US7786022B2Method for forming insulating film with low dielectric constantSHINETSU CHEMICAL CO·Filed 2008·Granted Aug 31, 2010·1 cites·6 claims
Showing the top 50 of 212 patent records by PatentIndex Score.
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