Inventor · disambiguated record
Masako Sugihara
Also filed as: SUGIHARA MASAKO
20 granted patents·7 pending applications·58 citations·filing 2007–2025
91Inventor score
Top patents by PatentIndex Score
27 records- 0196US8318403B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2010·Granted Nov 27, 2012·17 cites·10 claims
- 0293US8367298B2Salt and photoresist composition containing the sameSUMITOMO CHEMICAL CO·Filed 2010·Granted Feb 5, 2013·11 cites·10 claims
- 0393US8354217B2Salt and photoresist composition containing the sameSUMITOMO CHEMICAL CO·Filed 2010·Granted Jan 15, 2013·10 cites·10 claims
- 0482US8614046B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2010·Granted Dec 24, 2013·3 cites·11 claims
- 0581US8278023B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2010·Granted Oct 2, 2012·3 cites·10 claims
- 0678US9221785B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2010·Granted Dec 29, 2015·2 cites·6 claims
- 0776US9346750B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2010·Granted May 24, 2016·2 cites·12 claims
- 0875US8609317B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2010·Granted Dec 17, 2013·8 cites·7 claims
- 0975US2025370338A1Negative resist composition and method for producing resist patternSUMITOMO CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1073US11543749B2Resist composition and method for producing resist pattern, and method for producing plated molded articleSUMITOMO CHEMICAL CO·Filed 2021·Granted Jan 3, 2023·0 cites·10 claims
- 1173US2025321482A1Resist composition, dry film resist, method for producing dry film resist, method for forming resist pattern, and method for producing plated objectSUMITOMO CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1273US2025377594A1Resist composition, method for producing resist pattern and method for producing plated molded articleSUMITOMO CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1366US9182663B2Photoresist compositionSUMITOMO CHEMICAL CO·Filed 2013·Granted Nov 10, 2015·1 cites·10 claims
- 1465US8765351B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2010·Granted Jul 1, 2014·1 cites·8 claims
- 1560US12164229B2Resist composition and method for producing resist patternSUMITOMO CHEMICAL CO·Filed 2019·Granted Dec 10, 2024·0 cites·15 claims
- 1659US2025231484A1Resist composition, method for producing resist pattern and method for producing plated molded articleSUMITOMO CHEMICAL CO·Filed 2025·Application pending·0 cites
- 1753US9740097B2Resist composition and method for producing resist patternSUMITOMO CHEMICAL CO·Filed 2016·Granted Aug 22, 2017·0 cites·5 claims
- 1844US8318404B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2010·Granted Nov 27, 2012·0 cites·8 claims
- 1943US8481242B2Salt and photoresist composition containing the sameICHIKAWA KOJI·Filed 2010·Granted Jul 9, 2013·0 cites·10 claims
- 2040US11561471B2Photoresist compositionSUMITOMO CHEMICAL CO·Filed 2016·Granted Jan 24, 2023·0 cites·7 claims
- 2140US9726976B2Photoresist compositionICHIKAWA KOJI·Filed 2010·Granted Aug 8, 2017·0 cites·11 claims
- 2238US10365560B2Resist composition and method for producing resist patternSUMITOMO CHEMICAL CO·Filed 2016·Granted Jul 30, 2019·0 cites·5 claims
- 2337US10969685B2Photoresist compositionSUMITOMO CHEMICAL CO·Filed 2014·Granted Apr 6, 2021·0 cites·3 claims
- 2437US10101657B2Resin, resist composition and method for producing resist patternSUMITOMO CHEMICAL CO·Filed 2016·Granted Oct 16, 2018·0 cites·5 claims
- 2537US2010230136A1Method for producing resist patternSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 2636US2010203446A1Chemically amplified photoresist composition and method for forming patternSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 2735US2009142517A1Polarizing film with adhesive, optical laminate, and set of polarizing filmsSUMITOMO CHEMICAL CO·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →