Inventor · disambiguated record
Mariko Takagi
Also filed as: TAKAGI MARIKO
11 granted patents·2 pending applications·348 citations·filing 1994–2014
92Inventor score
Top patents by PatentIndex Score
13 records- 0190US6869867B2Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the same wherein the silicide on gate is thicker than on source-drainTOSHIBA KK·Filed 2001·Granted Mar 22, 2005·55 cites·3 claims
- 0283US5550400ASemiconductor device equipped with antifuse elements and a method for manufacturing an FPGATOSHIBA KK·Filed 1994·Granted Aug 27, 1996·68 cites·2 claims
- 0382US6169019B1Semiconductor apparatus and manufacturing method thereforTOSHIBA KK·Filed 1998·Granted Jan 2, 2001·56 cites·21 claims
- 0475US5866938ASemiconductor device equipped with antifuse elements and a method for manufacturing an FPGATOSHIBA KK·Filed 1996·Granted Feb 2, 1999·45 cites·5 claims
- 0572US6362511B1MIS-type semiconductor device having a multi-portion gate electrodeTOSHIBA KK·Filed 1999·Granted Mar 26, 2002·32 cites·14 claims
- 0671US8764889B2Silica film filter and process for producing silica film filterNGK INSULATORS LTD·Filed 2012·Granted Jul 1, 2014·2 cites·12 claims
- 0771US5625219AProgrammable semiconductor device using anti-fuse elements with floating electrodeTOSHIBA KK·Filed 1994·Granted Apr 29, 1997·46 cites·28 claims
- 0863US7220672B2Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the sameTOSHIBA KK·Filed 2005·Granted May 22, 2007·2 cites·4 claims
- 0958US7638432B2Semiconductor device comprising metal silicide films formed to cover gate electrode and source-drain diffusion layers and method of manufacturing the sameTOSHIBA KK·Filed 2007·Granted Dec 29, 2009·1 cites·3 claims
- 1055US5929505AInter-metal-wiring antifuse device provided by self-alignmentTOSHIBA KK·Filed 1995·Granted Jul 27, 1999·22 cites·14 claims
- 1152US5682059ASemiconductor device including anti-fuse element and method of manufacturing the deviceTOSHIBA KK·Filed 1996·Granted Oct 28, 1997·19 cites·17 claims
- 1246US2014374355A1Pretreatment device for membrane separation, membrane separating system and membrane separating methodNGK INSULATORS LTD·Filed 2014·Application pending·0 cites
- 1333US2003001218A1Semiconductor device with high driving force and less impurity punch-through and method of manufacturing the sameFiled 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →