Inventor · disambiguated record
Masaru Takeshita
Also filed as: TAKESHITA MASARU
42 granted patents·7 pending applications·244 citations·filing 1983–2024
97Inventor score
Files withTOKYO OHKA KOGYO CO LTD25TAKESHITA MASARU10MITSUI TOATSU CHEMICALS2MOMOSE HIKARU2UTSUMI YOSHIYUKI2
Top patents by PatentIndex Score
49 records- 0196US7482108B2Polymer compound, acid generator, positive resist composition, and method for formation of resist patternsTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jan 27, 2009·92 cites·18 claims
- 0290US8486605B2Positive resist composition and method of forming resist patternTAKESHITA MASARU·Filed 2010·Granted Jul 16, 2013·9 cites·8 claims
- 0390US8268529B2Positive resist composition, method of forming resist pattern using the same, and polymeric compoundDAZAI TAKAHIRO·Filed 2010·Granted Sep 18, 2012·9 cites·11 claims
- 0490US4516451AApparatus for cutting an elongate rubbery stripBRIDGESTONE TIRE CO LTD·Filed 1983·Granted May 14, 1985·56 cites·1 claims
- 0589US7968276B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Jun 28, 2011·11 cites·5 claims
- 0684US8530598B2Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resinTAKESHITA MASARU·Filed 2012·Granted Sep 10, 2013·4 cites·6 claims
- 0784US8247161B2Resist composition for immersion exposure, method of forming resist pattern, and fluorine-containing resinTAKESHITA MASARU·Filed 2009·Granted Aug 21, 2012·6 cites·8 claims
- 0883US7488568B2Resist composition, method of forming resist pattern, compound and acid generatorTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Feb 10, 2009·7 cites·15 claims
- 0976US7695889B2Copolymer for semiconductor lithography and process for production thereofMARUZEN PETROCHEM CO LTD·Filed 2006·Granted Apr 13, 2010·4 cites·18 claims
- 1075US8497395B2CompoundUTSUMI YOSHIYUKI·Filed 2011·Granted Jul 30, 2013·1 cites·1 claims
- 1174US8975010B2Method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2012·Granted Mar 10, 2015·2 cites·5 claims
- 1274US7829259B2Resin for photoresist composition, photoresist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2009·Granted Nov 9, 2010·2 cites·9 claims
- 1370US2025147413A1Method for producing structure having phase-separated structureTOKYO OHKA KOGYO CO LTD·Filed 2024·Application pending·0 cites
- 1468US7964331B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Jun 21, 2011·2 cites·10 claims
- 1568US7494759B2Positive resist compositions and process for the formation of resist patterns with the sameTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Feb 24, 2009·2 cites·17 claims
- 1666US7491485B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2008·Granted Feb 17, 2009·2 cites·9 claims
- 1764US12099298B2Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2021·Granted Sep 24, 2024·0 cites·6 claims
- 1864US9023577B2Resist composition and method of forming resist patternTAKESHITA MASARU·Filed 2012·Granted May 5, 2015·1 cites·5 claims
- 1962US7592123B2Resin for photoresist composition, photoresist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Sep 22, 2009·5 cites·11 claims
- 2061US8338075B2Positive resist composition and method of forming resist patternTAKESHITA MASARU·Filed 2009·Granted Dec 25, 2012·1 cites·9 claims
- 2161US7776511B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2007·Granted Aug 17, 2010·6 cites·16 claims
- 2260US2023314945A1Negative-tone resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2023·Application pending·0 cites
- 2359US8092979B2Resist polymer and resist compositionMOMOSE HIKARU·Filed 2009·Granted Jan 10, 2012·0 cites·41 claims
- 2454US8580481B2Resist polymer and resist compositionMOMOSE HIKARU·Filed 2011·Granted Nov 12, 2013·0 cites·47 claims
- 2554US7645559B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jan 12, 2010·4 cites·5 claims
- 2654US7575846B2Resist polymer and resist compositionMITSUBISHI RAYON CO·Filed 2004·Granted Aug 18, 2009·2 cites·15 claims
- 2752US2025130498A1Resist underlayer film formation composition, resist pattern formation method, formation method for resist underlayer film pattern, and pattern formation methodTOKYO OHKA KOGYO CO LTD·Filed 2022·Application pending·0 cites
- 2848US7939243B2Resin, resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted May 10, 2011·0 cites·13 claims
- 2947US7767378B2Method for producing resist composition and resist compositionTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Aug 3, 2010·0 cites·20 claims
- 3046US7855044B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Dec 21, 2010·0 cites·3 claims
- 3146US7638258B2Positive resist composition and method for resist pattern formationTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Dec 29, 2009·0 cites·12 claims
- 3246US7312015B2Process for refining crude resin for electronic materialTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Dec 25, 2007·1 cites·14 claims
- 3345US8216764B2Positive resist composition and method of forming resist patternTAKESHITA MASARU·Filed 2007·Granted Jul 10, 2012·0 cites·3 claims
- 3445US4994586AMethod for preparing epoxy compoundMITSUI TOATSU CHEMICALS·Filed 1989·Granted Feb 19, 1991·2 cites·18 claims
- 3544US8247159B2Positive resist composition and method of forming resist patternTAKESHITA MASARU·Filed 2007·Granted Aug 21, 2012·0 cites·6 claims
- 3643US8614049B2Resist composition and method of forming resist patternUTSUMI YOSHIYUKI·Filed 2011·Granted Dec 24, 2013·0 cites·6 claims
- 3743US7972762B2Positive resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2006·Granted Jul 5, 2011·0 cites·10 claims
- 3841US8535868B2Positive resist composition and method of forming resist patternTAKESHITA MASARU·Filed 2011·Granted Sep 17, 2013·0 cites·7 claims
- 3941US8097396B2Positive resist composition and method for forming resist patternSHIMIZU HIROAKI·Filed 2005·Granted Jan 17, 2012·0 cites·4 claims
- 4041US2007105038A1Positive resist composition and method for forming resist patternTAKESHITA MASARU·Filed 2004·Application pending·0 cites
- 4141US2007111135A1Positive resist composition and method of forming resist pattern using sameTOKYO OHKA KOGYO CO LTD·Filed 2004·Application pending·0 cites
- 4238US9411224B2Method of forming resist patternYOKOYA JIRO·Filed 2012·Granted Aug 9, 2016·0 cites·5 claims
- 4338US2006141382A1Resist composition and method of forming resist pattern using sameTAKESHITA MASARU·Filed 2003·Application pending·0 cites
- 4436US7682770B2Resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2004·Granted Mar 23, 2010·2 cites·14 claims
- 4535US8877432B2Method of forming resist pattern and resist compositionYOKOYA JIRO·Filed 2011·Granted Nov 4, 2014·0 cites·3 claims
- 4635US5220088AProcess for dimerizating n-buteneMITSUI TOATSU CHEMICALS·Filed 1991·Granted Jun 15, 1993·6 cites·6 claims
- 4735US2011008728A1Resist composition and method of forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2010·Application pending·0 cites
- 4832US6161752APlate width center alignment method and apparatus for welding machineMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Dec 19, 2000·5 cites·8 claims
- 4929US7763412B2Polymer, positive resist composition and method for forming resist patternTOKYO OHKA KOGYO CO LTD·Filed 2005·Granted Jul 27, 2010·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →