Inventor · disambiguated record
Masakazu Taki
Also filed as: TAKI MASAKAZU
26 granted patents·2 pending applications·738 citations·filing 1984–2015
97Inventor score
Top patents by PatentIndex Score
28 records- 0194US6287980B1Plasma processing method and plasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1999·Granted Sep 11, 2001·186 cites·40 claims
- 0292US6076483APlasma processing apparatus using a partition panelMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jun 20, 2000·82 cites·4 claims
- 0391US4988922APower supply for microwave discharge light sourceMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Jan 29, 1991·41 cites·12 claims
- 0489US8378674B2Magnetic field detection deviceMITSUBISHI ELECTRIC CORP·Filed 2008·Granted Feb 19, 2013·18 cites·2 claims
- 0586US5733405APlasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1996·Granted Mar 31, 1998·86 cites·21 claims
- 0685US5048048AGas laser deviceMITSUBISHI ELECTRIC CORP·Filed 1990·Granted Sep 10, 1991·49 cites·6 claims
- 0784US6167835B1Two chamber plasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Jan 2, 2001·43 cites·2 claims
- 0884US5115168APower supply for microwave discharge light sourceMITSUBISHI ELECTRIC CORP·Filed 1990·Granted May 19, 1992·38 cites·13 claims
- 0984US4571479AWelding machine with automatic seam trackingMITSUBISHI ELECTRIC CORP·Filed 1984·Granted Feb 18, 1986·33 cites·9 claims
- 1083US6929712B2Plasma processing apparatus capable of evaluating process performanceRENESAS TECH CORP·Filed 2002·Granted Aug 16, 2005·24 cites·7 claims
- 1183US5359177AMicrowave plasma apparatus for generating a uniform plasmaMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Oct 25, 1994·42 cites·43 claims
- 1280US10093566B2Water treatment apparatus and water treatment methodMITSUBISHI ELECTRIC CORP·Filed 2015·Granted Oct 9, 2018·2 cites·11 claims
- 1377US9957170B2Water treatment device and water treatment methodMITSUBISHI ELECTRIC CORP·Filed 2013·Granted May 1, 2018·2 cites·14 claims
- 1477US7786725B2Magnetic field detection apparatus for detecting an external magnetic field applied to a magnetoresistance effect element, and method of adjusting the sameMITSUBISHI ELECTRIC CORP·Filed 2006·Granted Aug 31, 2010·9 cites·6 claims
- 1576US8053254B2Apparatus for forming thin film and method of manufacturing semiconductor filmMITSUBISHI ELECTRIC CORP·Filed 2009·Granted Nov 8, 2011·4 cites·6 claims
- 1675US7773408B2Nonvolatile memory deviceRENESAS TECH CORP·Filed 2006·Granted Aug 10, 2010·8 cites·11 claims
- 1772US9868655B1Water treatment apparatus and water treatment methodMITSUBISHI ELECTRIC CORP·Filed 2015·Granted Jan 16, 2018·1 cites·14 claims
- 1869US4890294APlasma apparatusMITSUBISHI ELECTRIC CORP·Filed 1988·Granted Dec 26, 1989·25 cites·49 claims
- 1968US7733210B2Magnetic field detector and manufacturing method thereofMITSUBISHI ELECTRIC CORP·Filed 2006·Granted Jun 8, 2010·3 cites·20 claims
- 2066US7790478B2Manufacturing method of semiconductor integrated circuit deviceRENESAS TECH CORP·Filed 2008·Granted Sep 7, 2010·3 cites·27 claims
- 2161US7983075B2Nonvolatile memory deviceRENESAS ELECTRONICS CORP·Filed 2010·Granted Jul 19, 2011·2 cites·12 claims
- 2259US6020570APlasma processing apparatusMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Feb 1, 2000·23 cites·7 claims
- 2358US5144199AMicrowave discharge light source deviceMITSUBISHI ELECTRIC CORP·Filed 1991·Granted Sep 1, 1992·13 cites·19 claims
- 2448US10035718B2Water treatment apparatus and water treatment methodMITSUBISHI ELECTRIC CORP·Filed 2015·Granted Jul 31, 2018·0 cites·14 claims
- 2546US6756312B2Method of fabricating a semiconductor device including time-selective etching processMITSUBISHI ELECTRIC CORP·Filed 2001·Granted Jun 29, 2004·1 cites·18 claims
- 2643US8474403B2Apparatus for forming thin film and method of manufacturing semiconductor filmTSUDA MUTSUMI·Filed 2011·Granted Jul 2, 2013·0 cites·8 claims
- 2735US2003222349A1Semiconductor device with multilayer interconnection structureMITSUBISHI ELECTRIC CORP·Filed 2002·Application pending·0 cites
- 2835US2002088542A1Plasma processing apparatusFiled 2000·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →