Inventor · disambiguated record
Masatoshi Terayama
Also filed as: TERAYAMA MASATOSHI
8 granted patents·6 pending applications·3 citations·filing 2009–2023
75Inventor score
Top patents by PatentIndex Score
14 records- 0191US11833550B2Substrate processing apparatus and substrate processing methodKIOXIA CORP·Filed 2022·Granted Dec 5, 2023·2 cites·12 claims
- 0270US12172194B2Substrate processing apparatus and substrate processing methodKIOXIA CORP·Filed 2023·Granted Dec 24, 2024·0 cites·19 claims
- 0366US2023307261A1Substrate processing apparatus and method of substrate processingKIOXIA CORP·Filed 2022·Application pending·0 cites
- 0462US8017287B2Development method, method of manufacturing photomask, and method of manufacturing semiconductor deviceTOSHIBA KK·Filed 2009·Granted Sep 13, 2011·1 cites·19 claims
- 0555US8908150B2Substrate processing method, manufacturing method of EUV mask, and EUV maskTOSHIBA KK·Filed 2013·Granted Dec 9, 2014·0 cites·9 claims
- 0652US8383298B2Substrate processing method, manufacturing method of EUV mask, and EUV maskTOSHIBA KK·Filed 2011·Granted Feb 26, 2013·0 cites·20 claims
- 0752US2023420291A1Pattern forming method, template manufacturing method, and semiconductor device manufacturing methodKIOXIA CORP·Filed 2023·Application pending·0 cites
- 0848US8672563B2Development method, method of manufacturing photomask, method of manufacturing semiconductor device and development deviceSAKURAI HIDEAKI·Filed 2011·Granted Mar 18, 2014·0 cites·1 claims
- 0945US9116431B2Development processing apparatusTOSHIBA KK·Filed 2013·Granted Aug 25, 2015·0 cites·20 claims
- 1039US9841674B2Patterning method, and template for nanoimprint and producing method thereofTOSHIBA MEMORY CORP·Filed 2015·Granted Dec 12, 2017·0 cites·21 claims
- 1138US2013059241A1Development processing method and development processing apparatusSAKURAI HIDEAKI·Filed 2012·Application pending·0 cites
- 1233US2016068430A1Patterning methodTOSHIBA KK·Filed 2015·Application pending·0 cites
- 1333US2016068429A1Pattern forming method, photomask, and template for nanoimprintTOSHIBA KK·Filed 2015·Application pending·0 cites
- 1431US2011123665A1Imprint blank, imprint template and method for manufacturing the sameTERAYAMA MASATOSHI·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →