Inventor · disambiguated record
Masao Ushida
Also filed as: USHIDA MASAO
10 granted patents·86 citations·filing 1983–2007
89Inventor score
Top patents by PatentIndex Score
10 records- 0175US7611808B2Halftone type phase shift mask blank and halftone type phase shift maskHOYA CORP·Filed 2006·Granted Nov 3, 2009·3 cites·16 claims
- 0270US7166392B2Halftone type phase shift mask blank and halftone type phase shift maskHOYA CORP·Filed 2003·Granted Jan 23, 2007·9 cites·34 claims
- 0370US4563407APhoto-mask blank comprising a shading layer having a variable etch rateHOYA CORP·Filed 1983·Granted Jan 7, 1986·20 cites·17 claims
- 0468USD543160SPhotomask blankHOYA CORP·Filed 2004·Granted May 22, 2007·13 cites·1 claims
- 0562US7901842B2Photomask blank and method of producing the same, method of producing photomask, and method of producing semiconductor deviceHOYA CORP·Filed 2006·Granted Mar 8, 2011·1 cites·25 claims
- 0659US7217481B2Photomask blank, photomask, methods of manufacturing the same and methods of forming micropatternHOYA CORP·Filed 2005·Granted May 15, 2007·2 cites·16 claims
- 0758USD568839SPhotomask blankHOYA CORP·Filed 2007·Granted May 13, 2008·9 cites·1 claims
- 0853US6899979B1Photomask blank, photomask, methods of manufacturing the same, and method of forming micropatternHOYO CORP·Filed 1999·Granted May 31, 2005·17 cites·55 claims
- 0952US4696877APhoto-mask blank comprising a shading layer having a variable etch rateHOYA CORP·Filed 1986·Granted Sep 29, 1987·12 cites·6 claims
- 1037US7781125B2Lithography mask blankHOYA CORP·Filed 2003·Granted Aug 24, 2010·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →