Inventor · disambiguated record
Meguru Kashida
Also filed as: KASHIDA MEGURU
45 granted patents·13 pending applications·791 citations·filing 1986–2013
98Inventor score
Files withSHINETSU CHEMICAL CO49FUKUOKA HIROFUMI6ARAMATA MIKIO1SHIN ESTU CHEMICAL CO LTD1WATANABE KOICHIRO1
Top patents by PatentIndex Score
58 records- 0198US7776473B2Silicon-silicon oxide-lithium composite, making method, and non-aqueous electrolyte secondary cell negative electrode materialSHINETSU CHEMICAL CO·Filed 2007·Granted Aug 17, 2010·53 cites·16 claims
- 0291US4849491ACurable organopolysiloxane compositionSHINETSU CHEMICAL CO·Filed 1988·Granted Jul 18, 1989·48 cites·12 claims
- 0390US7425283B2Cyclic carbonate-modified siloxane, method of making, non-aqueous electrolytic solution, secondary battery, and capacitorSHINETSU CHEMICAL CO·Filed 2006·Granted Sep 16, 2008·11 cites·10 claims
- 0490US6436586B1Pellicle with a filter and method for production thereofSHINETSU CHEMICAL CO·Filed 2000·Granted Aug 20, 2002·48 cites·13 claims
- 0588US7459239B2Non-aqueous electrolytic solution and batterySHINETSU CHEMICAL CO·Filed 2005·Granted Dec 2, 2008·8 cites·5 claims
- 0688US4726964AMethod for imparting releasability to a substrate surfaceSHINETSU CHEMICAL CO·Filed 1986·Granted Feb 23, 1988·40 cites·10 claims
- 0785US8236068B2Separator for non-aqueous secondary battery, making method, and non-aqueous electrolyte secondary batteryARAMATA MIKIO·Filed 2011·Granted Aug 7, 2012·5 cites·15 claims
- 0880US5286567APellicle for photolithographic maskSHINETSU CHEMICAL CO·Filed 1992·Granted Feb 15, 1994·34 cites·2 claims
- 0979US5470621AFrame-supported pellicle for dustproof protection of photomaskSHINETSU CHEMICAL CO·Filed 1994·Granted Nov 28, 1995·34 cites·5 claims
- 1078US5723860AFrame-supported pellicle for photomask protectionSHINETSU CHEMICAL CO·Filed 1996·Granted Mar 3, 1998·53 cites·6 claims
- 1178US5378514AFrame-supported pellicle for photolithographySHINETSU CHEMICAL CO·Filed 1993·Granted Jan 3, 1995·36 cites·4 claims
- 1277US5616927AFrame-supported pellicle for dustproof protection of photomaskSHINETSU CHEMICAL CO·Filed 1994·Granted Apr 1, 1997·30 cites·3 claims
- 1376US7211353B2Non-aqueous electrolytic solution and secondary batterySHINETSU CHEMICAL CO·Filed 2006·Granted May 1, 2007·12 cites·4 claims
- 1476US5693382AFrame-supported pellicle for dustproof protection of photomask in photolithographySHINETSU CHEMICAL CO·Filed 1996·Granted Dec 2, 1997·36 cites·4 claims
- 1575US5139633AFilm-forming on substrate by sputteringSHINETSU CHEMICAL CO·Filed 1991·Granted Aug 18, 1992·28 cites·4 claims
- 1673US7722995B2Non-aqueous electrolytic solution, secondary battery, and electrochemical capacitorSHINETSU CHEMICAL CO·Filed 2006·Granted May 25, 2010·2 cites·9 claims
- 1773US5132366ACurable silicone compositionSHINETSU CHEMICAL CO·Filed 1990·Granted Jul 21, 1992·25 cites·10 claims
- 1869US7998263B2Sintered silicon oxide for film vapor deposition, its production method, and method for producing silicon oxide vapor deposition filmSHINETSU CHEMICAL CO·Filed 2009·Granted Aug 16, 2011·0 cites·10 claims
- 1968US5834143AFrame-supported dustproof pellicle for photolithographic photomaskSHINETSU CHEMICAL CO·Filed 1996·Granted Nov 10, 1998·26 cites·4 claims
- 2068US5691088APellicle for protection of photolithographic maskSHINETSU CHEMICAL CO·Filed 1992·Granted Nov 25, 1997·26 cites·4 claims
- 2168US5209996AMembrane consisting of silicon carbide and silicon nitride, method for the preparation thereof and mask for X-ray lithography utilizing the sameSHINETSU CHEMICAL CO·Filed 1992·Granted May 11, 1993·27 cites·1 claims
- 2266US5300348AFrame-supported pellicle for photolithography, comprising a fluorocarbon containing organopolysiloxane based adhesiveSHINETSU CHEMICAL CO·Filed 1992·Granted Apr 5, 1994·20 cites·3 claims
- 2361US5370951AFrame-supported pellicle for protection of photolithographic maskSHINETSU CHEMICAL CO·Filed 1993·Granted Dec 6, 1994·16 cites·18 claims
- 2460US5419972AFrame-supported pellicle for dustproof protection of photomaskSHINETSU CHEMICAL CO·Filed 1994·Granted May 30, 1995·15 cites·2 claims
- 2559US5199055AX-ray lithographic mask blank with reinforcementSHINETSU CHEMICAL CO·Filed 1992·Granted Mar 30, 1993·14 cites·12 claims
- 2659US2013266500A1Silicon oxide material for nonaqueous electrolyte secondary battery negative electrode material, making method, negative electrode, lithium ion secondary battery, and electrochemical capacitorSHINETSU CHEMICAL CO·Filed 2013·Application pending·0 cites
- 2758US5326649AX-ray transmitting membrane for mask in x-ray lithography and method for preparing the sameSHINETSU CHEMICAL CO·Filed 1992·Granted Jul 5, 1994·17 cites·4 claims
- 2858US4983701ASilicone composition for rendering surfaces non-adherentSHINETSU CHEMICAL CO·Filed 1989·Granted Jan 8, 1991·10 cites·16 claims
- 2958US2008057385A1Separator for non-aqueous secondary battery, making method, and non-aqueous electrolyte secondary batterySHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 3056US8066806B2Sintered silicon oxide for film vapor deposition, its production method, and method for producing silicon oxide vapor deposition filmFUKUOKA HIROFUMI·Filed 2011·Granted Nov 29, 2011·0 cites·10 claims
- 3156US5118573AMagneto-optical recording mediumSHINETSU CHEMICAL CO·Filed 1990·Granted Jun 2, 1992·10 cites·14 claims
- 3255US5597669AFrame-supported pellicle for photolithographySHINETSU CHEMICAL CO·Filed 1995·Granted Jan 28, 1997·14 cites·2 claims
- 3353US5729325APellicle for a mask or substrateSHINETSU CHEMICAL CO·Filed 1997·Granted Mar 17, 1998·14 cites·8 claims
- 3452US5234609AX-ray permeable membrane for X-ray lithographic maskSHINETSU CHEMICAL CO·Filed 1992·Granted Aug 10, 1993·14 cites·4 claims
- 3550US2007224509A1SiCO-Li COMPOSITE, MAKING METHOD, AND NON-AQUEOUS ELECTROLYTE SECONDARY CELL NEGATIVE ELECTRODE MATERIALSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 3649US2008254287A1Silicon carbide-silicon carbide fiber composite and making methodFUKUOKA HIROFUMI·Filed 2008·Application pending·0 cites
- 3748US2008070120A1Non-aqueous electrolyte secondary battery and making methodSHINETSU CHEMICAL CO·Filed 2007·Application pending·0 cites
- 3848US2011287313A1Silicon oxide material for nonaqueous electrolyte secondary battery negative electrode material, making method, negative electrode, lithium ion secondary battery, and electrochemical capacitorFUKUOKA HIROFUMI·Filed 2011·Application pending·0 cites
- 3948US2009311606A1Negative electrode material, making method, lithium ion secondary battery, and electrochemical capacitorFUKUOKA HIROFUMI·Filed 2009·Application pending·0 cites
- 4048US2007048621A1Non-aqueous electrolytic solution, secondary battery, and electrochemical capacitorSHINETSU CHEMICAL CO·Filed 2006·Application pending·0 cites
- 4147US2009202911A1Non-aqueous electrolyte secondary battery negative electrode material, making method, lithium ion secondary battery, and electrochemical capacitorFUKUOKA HIROFUMI·Filed 2009·Application pending·0 cites
- 4245US5327808AMethod for the preparation of a frame-supported pellicle for photolithographySHINETSU CHEMICAL CO·Filed 1993·Granted Jul 12, 1994·14 cites·3 claims
- 4344US6350549B1Jig for producing pellicle and method for producing pellicle using the sameSHINETSU CHEMICAL CO·Filed 1999·Granted Feb 26, 2002·11 cites·12 claims
- 4444US2010243951A1Negative electrode material for nonaqueous electrolyte secondary battery, making method and lithium ion secondary batterySHINETSU CHEMICAL CO·Filed 2010·Application pending·0 cites
- 4543US7544759B2Cyclic carbonate-modified organosilicon compound, non-aqueous electrolytic solution, secondary battery and capacitorSHINETSU CHEMICAL CO·Filed 2005·Granted Jun 9, 2009·0 cites·17 claims
- 4643US2010288970A1Negative electrode material for nonaqueous electrolyte secondary battery, making method and lithium ion secondary batteryWATANABE KOICHIRO·Filed 2010·Application pending·0 cites
- 4742US2010179049A1Silicon carbide-silicon carbide fiber composite and making methodFUKUOKA HIROFUMI·Filed 2010·Application pending·0 cites
- 4841US2007059607A1Cyclic carbonate-modified organosilicon compound, non-aqueous electrolytic solution comprising same, secondary battery, and capacitorSHIN ESTU CHEMICAL CO LTD·Filed 2006·Application pending·0 cites
- 4940US5656342AEnd surface-protected frame-supported pellicle for photolithographySHINETSU CHEMICAL CO·Filed 1995·Granted Aug 12, 1997·6 cites·4 claims
- 5038US5368675AMethod for the preparation of a frame-supported pellicle for photolithographySHINETSU CHEMICAL CO·Filed 1993·Granted Nov 29, 1994·6 cites·4 claims
Showing the top 50 of 58 patent records by PatentIndex Score.
Join the waitlist — get patent alerts
Get an alert when Meguru Kashida files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →