Inventor · disambiguated record
Mitsuru Haga
Also filed as: HAGA MITSURU
5 granted patents·8 pending applications·2 citations·filing 2016–2024
62Inventor score
Files withROHM & HAAS ELECT MAT9DOW GLOBAL TECHNOLOGIES LLC2DUPONT ELECTRONIC MAT INTERNATIONAL LLC2
Top patents by PatentIndex Score
13 records- 0173US10527935B2Radiation-sensitive compositions and patterning and metallization processesROHM & HAAS ELECT MAT·Filed 2017·Granted Jan 7, 2020·2 cites·11 claims
- 0264US2025244664A1Photoresist compositions and patterning methodsDUPONT ELECTRONIC MAT INTERNATIONAL LLC·Filed 2024·Application pending·0 cites
- 0358US2025102910A1Photoresist composition and metallization methodDUPONT ELECTRONIC MAT INTERNATIONAL LLC·Filed 2023·Application pending·0 cites
- 0456US2020388413A1Photosensitive resin compositionROHM & HAAS ELECT MAT·Filed 2020·Application pending·0 cites
- 0556US2024055382A1Metallization methodROHM & HAAS ELECT MAT·Filed 2023·Application pending·0 cites
- 0655US11940730B2Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2021·Granted Mar 26, 2024·0 cites·15 claims
- 0753US12512430B2Metallization methodROHM & HAAS ELECT MAT·Filed 2022·Granted Dec 30, 2025·0 cites·8 claims
- 0853US2018174701A1Photosensitive resin compositionROHM & HAAS ELECT MAT·Filed 2016·Application pending·0 cites
- 0952US10962880B2Radiation-sensitive compositions and patterning and metallization processesROHM & HAAS ELECT MAT·Filed 2019·Granted Mar 30, 2021·0 cites·5 claims
- 1047US11880135B2Photoresist compositions and pattern formation methodsROHM & HAAS ELECT MAT·Filed 2020·Granted Jan 23, 2024·0 cites·9 claims
- 1137US2019136086A1SILSESQUINOXANE MODIFIED TiO2 SOLDOW GLOBAL TECHNOLOGIES LLC·Filed 2016·Application pending·0 cites
- 1237US2018030600A1Method for plating on surface of non-conductive substrateROHM & HAAS ELECT MAT·Filed 2017·Application pending·0 cites
- 1333US2018364572A1Photo-imageable thin films with high dielectric constantsDOW GLOBAL TECHNOLOGIES LLC·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →