Inventor · disambiguated record
Michiaki Hashimoto
Also filed as: HASHIMOTO MICHIAKI · KOHASHI TAKAHIRO
17 granted patents·320 citations·filing 1976–1998
95Inventor score
Top patents by PatentIndex Score
17 records- 0193US4565768APhotosensitive azide composition with alkali soluble polymer and process of using to form resist patternHITACHI CHEMICAL CO LTD·Filed 1984·Granted Jan 21, 1986·67 cites·8 claims
- 0293US4273842AProcess for forming patternwise coated powder layerHITACHI LTD·Filed 1978·Granted Jun 16, 1981·36 cites·42 claims
- 0370US6319649B1Photosensitive resin composition and method of forming resist imagesHITACHI LTD·Filed 1998·Granted Nov 20, 2001·31 cites·20 claims
- 0470US4835089AResist pattern forming process with dry etchingHITACHI LTD·Filed 1987·Granted May 30, 1989·22 cites·34 claims
- 0570US4412236AColor solid-state imagerHITACHI LTD·Filed 1980·Granted Oct 25, 1983·27 cites·16 claims
- 0668US4395629ASolid-state color imager and method of manufacturing the sameHITACHI LTD·Filed 1980·Granted Jul 26, 1983·26 cites·17 claims
- 0767US4311773AMethod of producing color filtersHITACHI LTD·Filed 1980·Granted Jan 19, 1982·24 cites·16 claims
- 0864US4241162ALight sensitive photoresist materialsHITACHI LTD·Filed 1976·Granted Dec 23, 1980·15 cites·21 claims
- 0961US4985344ARadiation imaging process for forming pattern without alkali-soluble polymer underlayer and water soluble radiation-sensitive diazonium salt overlayerHITACHI LTD·Filed 1989·Granted Jan 15, 1991·14 cites·20 claims
- 1059US4285007AColor solid-state imager and method of making the sameHITACHI LTD·Filed 1980·Granted Aug 18, 1981·17 cites·8 claims
- 1158US5024920AProcess for forming a pattern using a photosensitive azide and a high-molecular weight copolymer or polymerHITACHI LTD·Filed 1989·Granted Jun 18, 1991·12 cites·1 claims
- 1253US5290666AMethod of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium saltHITACHI LTD·Filed 1991·Granted Mar 1, 1994·5 cites·10 claims
- 1349US5314783APhotosensitive quinone diazide and resin composition having high absorbency for a wavelength of 365 nm containing a benzotriazole ultraviolet absorbing compoundHITACHI CHEMICAL CO LTD·Filed 1992·Granted May 24, 1994·8 cites·10 claims
- 1446US4728594APhotosensitive composition with azide or bisazide compound with oxazolone groupHITACHI CHEMICAL CO LTD·Filed 1986·Granted Mar 1, 1988·11 cites·6 claims
- 1533US5215858APhotosensitive resin composition and pattern formation using the sameHITACHI CHEMICAL CO LTD·Filed 1989·Granted Jun 1, 1993·2 cites·2 claims
- 1631US4430400AMethod of producing color filters using dehydrating solutionHITACHI LTD·Filed 1981·Granted Feb 7, 1984·3 cites·16 claims
- 1725US4983500ARadiation imaging process for formation of contrast enhanced pattern using two photosensitive dialonium salt layers with removal of overlayer and developed resist pattern in underlayerHITACHI LTD·Filed 1988·Granted Jan 8, 1991·0 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →