Inventor · disambiguated record
Michael L. Hattendorf
Also filed as: HATTENDORF MICHAEL · HATTENDORF MICHAEL L
86 granted patents·24 pending applications·650 citations·filing 1998–2025
99Inventor score
Top patents by PatentIndex Score
110 records- 0198US10304940B1Gate cut and fin trim isolation for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted May 28, 2019·13 cites·20 claims
- 0298US10121875B1Replacement gate structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Nov 6, 2018·61 cites·25 claims
- 0398US10121882B1Gate line plug structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Nov 6, 2018·56 cites·20 claims
- 0498US7402872B2Method for forming an integrated circuitINTEL CORP·Filed 2006·Granted Jul 22, 2008·141 cites·15 claims
- 0597US11031487B2Contact over active gate structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2019·Granted Jun 8, 2021·7 cites·20 claims
- 0697US10886383B2Replacement gate structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2020·Granted Jan 5, 2021·4 cites·12 claims
- 0797US10615265B2Gate cut and fin trim isolation for advanced integrated circuit structure fabricationINTEL CORP·Filed 2019·Granted Apr 7, 2020·8 cites·5 claims
- 0897US9882027B2Confined epitaxial regions for semiconductor devices and methods of fabricating semiconductor devices having confined epitaxial regionsINTEL CORP·Filed 2014·Granted Jan 30, 2018·12 cites·8 claims
- 0997US7195985B2CMOS transistor junction regions formed by a CVD etching and deposition sequenceINTEL CORP·Filed 2005·Granted Mar 27, 2007·98 cites·14 claims
- 1096US11664439B2Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2021·Granted May 30, 2023·2 cites·22 claims
- 1196US11640988B2Confined epitaxial regions for semiconductor devices and methods of fabricating semiconductor devices having confined epitaxial regionsINTEL CORP·Filed 2021·Granted May 2, 2023·2 cites·23 claims
- 1296US11508626B2Dual metal silicide structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2020·Granted Nov 22, 2022·3 cites·20 claims
- 1396US10741669B2Differentiated voltage threshold metal gate structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Aug 11, 2020·10 cites·11 claims
- 1496US10541316B2Contact over active gate structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Jan 21, 2020·9 cites·25 claims
- 1595US11887838B2Trench plug hardmask for advanced integrated circuit structure fabricationINTEL CORP·Filed 2022·Granted Jan 30, 2024·2 cites·23 claims
- 1695US11380683B2Fin end plug structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2020·Granted Jul 5, 2022·3 cites·20 claims
- 1795US10460993B2Fin cut and fin trim isolation for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Oct 29, 2019·6 cites·5 claims
- 1895US7595248B2Angled implantation for removal of thin film layersINTEL CORP·Filed 2005·Granted Sep 29, 2009·28 cites·8 claims
- 1995US7479432B2CMOS transistor junction regions formed by a CVD etching and deposition sequenceINTEL CORP·Filed 2006·Granted Jan 20, 2009·31 cites·9 claims
- 2094US11088261B2Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2019·Granted Aug 10, 2021·3 cites·25 claims
- 2194US10777656B2Fin cut and fin trim isolation for advanced integrated circuit structure fabricationINTEL CORP·Filed 2019·Granted Sep 15, 2020·3 cites·23 claims
- 2294US10734379B2Fin end plug structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Aug 4, 2020·9 cites·20 claims
- 2393US7678631B2Formation of strain-inducing filmsINTEL CORP·Filed 2006·Granted Mar 16, 2010·22 cites·6 claims
- 2492US12255247B2Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2024·Granted Mar 18, 2025·0 cites·20 claims
- 2592US11581420B2Contact over active gate structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2021·Granted Feb 14, 2023·2 cites·20 claims
- 2692US10840151B2Dual metal silicide structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2019·Granted Nov 17, 2020·5 cites·20 claims
- 2792US10790378B2Replacement gate structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2018·Granted Sep 29, 2020·3 cites·14 claims
- 2892US10756204B2Fin trim isolation with single gate spacing for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Aug 25, 2020·6 cites·10 claims
- 2992US8896030B2Integrated circuits with selective gate electrode recessMUKHERJEE SRIJIT·Filed 2012·Granted Nov 25, 2014·21 cites·16 claims
- 3091US10707133B2Trench plug hardmask for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Jul 7, 2020·5 cites·14 claims
- 3191US10461177B2Confined epitaxial regions for semiconductor devices and methods of fabricating semiconductor devices having confined epitaxial regionsINTEL CORP·Filed 2018·Granted Oct 29, 2019·4 cites·7 claims
- 3290US11127841B2Confined epitaxial regions for semiconductor devices and methods of fabricating semiconductor devices having confined epitaxial regionsINTEL CORP·Filed 2019·Granted Sep 21, 2021·3 cites·9 claims
- 3390US10727313B2Dual metal gate structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Jul 28, 2020·3 cites·16 claims
- 3489US10957782B2Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Mar 23, 2021·2 cites·18 claims
- 3589US10861850B2Fin end plug structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2020·Granted Dec 8, 2020·2 cites·20 claims
- 3688US11948997B2Trench contact structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2023·Granted Apr 2, 2024·0 cites·20 claims
- 3788US9633835B2Transistor fabrication technique including sacrificial protective layer for source/drain at contact locationINTEL CORP·Filed 2013·Granted Apr 25, 2017·7 cites·19 claims
- 3888US2024405101A1Confined epitaxial regions for semiconductor devices and methods of fabricating semiconductor devices having confined epitaxial regionsINTEL CORP·Filed 2024·Application pending·0 cites
- 3987US12225740B2Dual metal silicide structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2024·Granted Feb 11, 2025·0 cites·20 claims
- 4087US11881520B2Fin patterning for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Jan 23, 2024·2 cites·10 claims
- 4187US10796968B2Dual metal silicide structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2017·Granted Oct 6, 2020·3 cites·20 claims
- 4287US2025359007A1Fin cut and fin trim isolation for advanced integrated circuit structure fabricationINTEL CORP·Filed 2025·Application pending·0 cites
- 4387US2024347394A1Integrated circuits with recessed gate electrodesINTEL CORP·Filed 2024·Application pending·0 cites
- 4486US11063133B2Fin cut and fin trim isolation for advanced integrated circuit structure fabricationINTEL CORP·Filed 2020·Granted Jul 13, 2021·1 cites·24 claims
- 4585US12349450B2Trench plug hardmask for advanced integrated circuit structure fabricationINTEL CORP·Filed 2023·Granted Jul 1, 2025·0 cites·20 claims
- 4685US12284826B2Fin end plug structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2024·Granted Apr 22, 2025·0 cites·20 claims
- 4785US11011616B2Gate line plug structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2018·Granted May 18, 2021·1 cites·7 claims
- 4885US10854732B2Dual metal gate structures for advanced integrated circuit structure fabricationINTEL CORP·Filed 2020·Granted Dec 1, 2020·1 cites·20 claims
- 4985US9419106B2Non-planar transistors and methods of fabrication thereofJOSHI SUBHASH M·Filed 2011·Granted Aug 16, 2016·9 cites·9 claims
- 5084US12426230B2Fin cut and fin trim isolation for advanced integrated circuit structure fabricationINTEL CORP·Filed 2024·Granted Sep 23, 2025·0 cites·20 claims
Showing the top 50 of 110 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →