Inventor · disambiguated record
Michikazu Morimoto
Also filed as: MORIMOTO MICHIKAZU
21 granted patents·4 pending applications·102 citations·filing 2010–2022
94Inventor score
Technology areasH10P
Files withHITACHI HIGH TECH CORP20INOUE YOSHIHARU2MORIMOTO MICHIKAZU1OOKUMA KAZUMASA1WATANABE TOMOYUKI1
Top patents by PatentIndex Score
25 records- 0195US10600619B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Mar 24, 2020·11 cites·3 claims
- 0295US8889024B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2014·Granted Nov 18, 2014·17 cites·6 claims
- 0393US9349603B2Plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Granted May 24, 2016·11 cites·7 claims
- 0491US9305803B2Plasma processing apparatus and plasma processing methodMORIMOTO MICHIKAZU·Filed 2011·Granted Apr 5, 2016·23 cites·8 claims
- 0591US8828254B2Plasma processing methodINOUE YOSHIHARU·Filed 2012·Granted Sep 9, 2014·11 cites·5 claims
- 0689US9336999B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Granted May 10, 2016·7 cites·9 claims
- 0784US9741579B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Granted Aug 22, 2017·5 cites·4 claims
- 0882US8992724B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2013·Granted Mar 31, 2015·5 cites·10 claims
- 0981US9502217B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2015·Granted Nov 22, 2016·3 cites·4 claims
- 1080US9514967B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2013·Granted Dec 6, 2016·4 cites·5 claims
- 1179US10037909B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2015·Granted Jul 31, 2018·3 cites·9 claims
- 1269US11658011B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2020·Granted May 23, 2023·0 cites·3 claims
- 1367US8801951B2Plasma processing methodINOUE YOSHIHARU·Filed 2011·Granted Aug 12, 2014·2 cites·8 claims
- 1460US11004658B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2018·Granted May 11, 2021·0 cites·7 claims
- 1556US10192718B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted Jan 29, 2019·0 cites·14 claims
- 1654US8741166B2Plasma etching methodHITACHI HIGH TECH CORP·Filed 2012·Granted Jun 3, 2014·0 cites·6 claims
- 1754US2025239437A1Plasma processing methodHITACHI HIGH TECH CORP·Filed 2022·Application pending·0 cites
- 1850US10727088B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted Jul 28, 2020·0 cites·8 claims
- 1950US10522331B2Plasma processing apparatusHITACHI HIGH TECH CORP·Filed 2016·Granted Dec 31, 2019·0 cites·2 claims
- 2050US2014057445A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2013·Application pending·0 cites
- 2148US10559481B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2016·Granted Feb 11, 2020·0 cites·4 claims
- 2247US8580131B2Plasma etching methodWATANABE TOMOYUKI·Filed 2012·Granted Nov 12, 2013·0 cites·4 claims
- 2345US12437968B2Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2020·Granted Oct 7, 2025·0 cites·11 claims
- 2443US2015170886A1Plasma processing apparatus and plasma processing methodHITACHI HIGH TECH CORP·Filed 2014·Application pending·0 cites
- 2526US2012003838A1Plasma etching methodOOKUMA KAZUMASA·Filed 2010·Application pending·0 cites
Join the waitlist — get patent alerts
Get an alert when Michikazu Morimoto files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →